| AVS 45th International Symposium | |
| Electronic Materials and Processing Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | EM+PS-ThM1 Growth and Characterization of Ba@sub 0.6@Sr@sub 0.4@TiO@sub 3@ Thin Films on Si with Pt Electrodes L. Kinder, I.L. Grigorov, C. Kwon, Q.X. Jia, Los Alamos National Laboratory, L. Luo, J. Zhao, Applied Materials, Inc. |
| 8:40am | EM+PS-ThM2 Synthesized Single Crystalline Ba@sub (1-x)@Sr@sub x@TiO @sub 3@ Thin Films for DRAM Application F.F. Feng, C.L. Chen, Z.H. Zhang, Y. Liou, P. Jin, W.K. Chu, C.W. Chu, University of Houston |
| 9:00am | EM+PS-ThM3 Scanning Capacitance Imaging for Evaluation of High-k Dielectric Oxide Materials Y. Yamaguchi, K.P. Wiederhold, B.D. White, N.E. Wittry, H.C. Galloway, Southwest Texas State University |
| 9:20am | EM+PS-ThM4 Characterization of Thermal Annealing of Tantalum Pentoxide for High-k Dielectric Applications R.L. Opila, J.P. Chang, G.B. Alers, Bell Laboratories, Lucent Technologies |
| 9:40am | EM+PS-ThM5 Structural Properties of Ultrathin Films of High Dielectric Constant Materials on Silicon E. Gusev, IBM T.J. Watson Research Center, H.C. Lu, T. Gustafsson, E. Garfunkel, Rutgers University, G.B. Alers, Bell Laboratories, Lucent Technologies |
| 10:00am | EM+PS-ThM6 Invited Paper Etching of High Dielectric Constant Materials for DRAMs and Ferroelectric Materials for FeRAMs L.G. Jerde, A. Cofer, K. Olson, P. Rajora, S.P. DeOrnellas, Tegal Corporation |
| 10:40am | EM+PS-ThM8 Patterning of Reactively Sputtered Tantalum Pentoxide, a High Epsilon Material, by Plasma Etching L.B. Jonsson, F. Engelmark, J. Du, C. Hedlund, Uppsala University, Sweden, U. Smith, Ericsson Components AB, Sweden, H.-O. Blom, Uppsala University, Sweden |
| 11:00am | EM+PS-ThM9 The High Temperature Platinum Etching Using Titanium Layer H.-W. Kim, B. Ju, B. Nam, W. Yoo, C.J. Kang, T.-H. Ahn, J. Moon, M.Y. Lee, Samsung Electronics, Co., Korea |
| 11:20am | EM+PS-ThM10 Removal of Sidewall Re-depositions Formed by Reactive Ion Etching of Platinum for Embedded DRAM Applications H.M. Ranpura, D.H. Butler, S.P. Beaudoin, Arizona State University, C.J. Tracy, L. Chang, Motorola Semiconductor Products Sector |
| 11:40am | EM+PS-ThM11 Study on Surface Reaction of (Ba,Sr)TiO@sub 3@ Thin Films by High Density Plasma Etching S.B. Kim, C.I. Kim, E.G. Chang, Chung-ang University, Korea |