AVS 55th International Symposium & Exhibition
    Electronic Materials and Processing Thursday Sessions

Session EM-ThP
Electronic Materials and Processing Poster Session

Thursday, October 23, 2008, 6:00 pm, Room Hall D


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

EM-ThP1
Effect of Water Immersion and Surface Compositional Profile of Photoacid Generator Molecules in Photoresist Materials
S. Sambasivan, Suffolk Community College, V.M. Prabhu, D.A. Fischer, National Institute of Standards and Technology, L.K. Sundberg, R.D. Allen, IBM Almaden Research Center
EM-ThP2
Direct Evidence for Post-Crystallization Germanium Precipitation in Thin Films of Phase-Change Material Ge15Sb85
C. Cabral, Jr., L. Krusin-Elbaum, IBM T.J. Watson Research Center, S. Raoux, V.R. Deline, IBM Almaden Research Center, J. Bruley, A Madan, T.L. Pinto, IBM Hudson Valley Research Park
EM-ThP3
Development of a Polycrystalline Zinc Oxide Scintillator for Radiation Detection
D.M. DeVito, J.S. Neal, B.L. Armstrong, Oak Ridge National Laboratory, M. Hong, University of California - Davis, B. Kesanli, J.O. Ramey, J.Y. Howe, Oak Ridge National Laboratory, X. Yang, N.C. Giles, West Virginia University, Z.A. Munir, University of California - Davis, L.A. Boatner, Oak Ridge National Laboratory
EM-ThP4
Structure and Optical Behavior of Sputter Deposited Hafnia-Alumina Nanolaminate Films
E.E. Hoppe, M. AlMomani, C.R. Aita, University of Wisconsin-Milwaukee
EM-ThP5
Properties of Mn Doped ZnO Hollow Nanosphere Structures
D.-R. Liu, C.-C. Kei, C.-Y. Su, W.-C. Chen, National Applied Research Laboratories, Taiwan
EM-ThP6
Electrical Properties of Atomic Layer Deposited ZnO Thin Film Transistor with Various Channel Layer Thickness
W. Jeong, S. Bang, S. Lee, S. Jeon, S. Kwon, H.T. Jeon, Hanyang University, Korea
EM-ThP7
Characterization of P-Si/SiO2/N+Si Devices with Various Thickness of SiO2
S.M. Lee, B.I. Son, K.H. Eum, I.S. Chung, Sungkyunkwan University, Korea
EM-ThP8
Role of Adsorbates in Surface Electron Accumulation on InN Films
R.P. Bhatta, A.R. Acharya, B.D. Thoms, M. Alevli, N. Dietz, Georgia State University
EM-ThP9
Effect of TCO Buffer Layer on the Growth of InN Film by MOMBE
W.-C. Chen, National Applied Research Laboratories, Taiwan, S.-Y. Kuo, Chang Gung University, Taiwan, H.-C. Pan, Gintech Energy Corporation, Taiwan, F.-I. Lai, Yuan Ze University, Taiwan, C.-N. Hsiao, National Applied Research Laboratories, Taiwan
EM-ThP10
Synthesis of Ordered Arrays of (Ba0.6,Sr0.4)TiO3 Nanotubes
G.H. Kim, K.T. Kim, C.I. Kim, Chungang University, Korea, Y.K. Yoon, University at Buffalo, the State University of New York
EM-ThP11
Fabrication of Cerium Oxide Nanopillars for Oxygen Gas Sensor by Nanosphere Lithography
P.-J. Ko, J.-S. Park, H.-Y. Na, Chosun University, Korea, N.-H. Kim, Chonnam National University, Korea, W.-S. Lee, Chosun University, Korea
EM-ThP12
Influence of Acid Etching of MgAl2O4 (111) Substrate on the Deposition of ZnO Thin Film by MOCVD
G.Y. Jhan, Y.J. Chen, H.Y. Lai, J.H. Du, J.H. Liang, National Dong Hwa University, Taiwan
EM-ThP13
Self-Limiting Growth of Semiconductor Grade Zinc Oxide at Low Temperature by Pulsed Pecvd and Plasma-Enhanced Atomic Layer Deposition
P. Rowlette, C.G. Allen, O. Bromley, D.N. Richards, A. Dubetz, C.A. Wolden, Colorado School of Mines