| AVS 55th International Symposium & Exhibition | |
| Applied Surface Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| AS-TuP1 UNIFIT 2008 - Spectrum Processing, Analysis and Presentation Software for Photoelectron Spectra R. Hesse, P. Streubel, R. Denecke, University of Leipzig, Germany |
| AS-TuP2 Test of the Consistency of Angle Resolved XPS Data for Depth Profile Reconstruction Using the Maximum Entropy Method A.J. Roberts, K Macak, D.J. Surman, Kratos Analytical Ltd, UK |
| AS-TuP3 Analysis Area Determination in Small Area XPS C.J. Blomfield, S.J. Hutton, S.C. Page, S.J. Coultas, Kratos Analytical Ltd, UK |
| AS-TuP5 Characterization of X-ray Photocathode in Transmission Mode at 3keV H. Ikeura-Sekiguchi, National Institute of Advanced Industrial Science and Technology (AIST), Japan, T. Sekiguchi, Japan Atomic Energy Agency (JAEA), M. Koike, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| AS-TuP6 Advanced Data Analysis for Surface Topography Characterization of Niobium Superconducting RF Accelerator Cavities H. Tian, College of William & Mary, G. Ribeill, North Carolina State University, C.E. Reece, Thomas Jefferson National Accelerator Facility, M.J. Kelley, College of William & Mary |
| AS-TuP7 XPS Analysis of a Complex Metal Oxide Coatings on Stainless Steel: Depth Profiling H.M. Meyer, III, Oak Ridge National Laboratory |
| AS-TuP8 Structural Characterization of Ag Nanoparticles Embedded in TiO2 Thin Films Prepared by Means of RF-Magnetron Sputtering V. Moellmann, University of Paderborn, Germany, P. Keil, J. Zuo, H. Itani, T. Titz, Max-Planck-Institut fuer Eisenforschung GmbH, Germany, G. Grundmeier, University of Paderborn, Germany |
| AS-TuP9 Deposition and Characterization of Aluminum Oxynitride Optical Coatings Y. Liu, N. Gunda, R. Cooke, R. Raman, Entegris Inc. |
| AS-TuP10 Quantitative Analysis of Si-Ge Alloy Films and Compositional Depth Profiling of Si/Ge Multi Layers Using SIMS K.J. Kim, J.S. Jang, Korea Research Institute of Standards and Science, T.E. Hong, Korea Basic Science Institute, H.J. Kang, Chungbuk National University, Korea |
| AS-TuP11 Quantitative Multi-Technique Analysis of Silicon Germanium Semiconductors R.E. Davis, M. Hatzistergos, B.M. St. Lawrence, T.L. Tai, A.G. Domenicucci, A Madan, T.L. Pinto, P. Ronsheim, Z. Zhu, A.R. Turansky, J.R. Holt, M. Hopstaken, T.N. Adam, IBM Corp. |
| AS-TuP12 Atmospheric Plasma Surface Modification Analysis by Energy Resolved Molecular Beam Mass Spectrometry and SIMS P.J. Hatton, Y. Aranda Gonzalvo, G.A. Cooke, T.D. Whitmore, D.L. Seymour, C.L. Greenwood, J.A. Rees, Hiden Analytical, UK |
| AS-TuP13 A Mutual Calibration Method to Certify the Thickness of Nanometer Oxide Films K.J. Kim, Y.S. Kim, J.S. Jang, J.W. Kim, Korea Research Institute of Standards and Science |
| AS-TuP14 Imaging Surface Organics via Single Photon Secondary Neutral Mass Spectrometry with Tunable Synchrotron VUV L.K. Takahashi, J. Zhou, M. Ahmed, Lawrence Berkeley National Laboratory, S.R. Leone, University of California, Berkeley, K.R. Wilson, Lawrence Berkeley National Laboratory |
| AS-TuP16 Effect of Polymer MW on XPS Valence Band Spectra J.L. Fenton, J. Chen, The Dow Chemical Company |
| AS-TuP17 Temperature Effect on Chemical and Physical Stability of Low Pressure Plasma Polymerised Coatings for Biological Applications S.I. Cho, Pusan National University, South Korea, M. Dhayal, University of Washington |
| AS-TuP18 The Electronic Structure of Pristine Copper-Hexadecafluorophthalocyanine (F16CuPc) from Resonant X-ray Emission Spectroscopy A. DeMasi, L.F.J. Piper, Boston University, Y. Zhang, University of Nevada, Las Vegas, K.E. Smith, Boston University |
| AS-TuP19 XPS Analysis of Organic Materials Etched by Charged Water Droplet Impact Y. Sakai, University of Yamanashi, Japan, Y. Iijima, JEOL Ltd., R. Takaishi, D. Asakawa, K. Hiraoka, University of Yamanashi, Japan |
| AS-TuP20 XPS Study of Nitrogen Chemical Structure in DNA and Related Molecules I. Ishizaki, N. Sanada, S. Iida, M. Suzuki, Y. Ohashi, ULVAC-PHI, Inc., Japan, G. Hayashi, K. Nakatani, Osaka University, Japan |
| AS-TuP21 Analysis of DLC Fine Structure on Sliders by Using Second Derivative Carbon KLL Auger Spectra K.W. Wierman, F.Y. Chen, Seagate Technology |
| AS-TuP22 Root-Cause Failure Analysis of Anneal-Chamber Reflector Plates using Advanced XPS and TEM/EDX Applications C. Lazik, M. Jin, Y. Uritsky, L. Terry, Applied Materials, Inc. |
| AS-TuP23 Microstructural Transformations of Ultrathin TiDy/Pd Bi-Layer Films Evaporated on Si(100) and Quartz Induced by Vacuum Annealing E.G. Keim, University of Twente, The Netherlands, W. Lisowski, Polish Academy of Sciences, M.A. Smithers, University of Twente, The Netherlands |
| AS-TuP24 Analysis of the Line Shape on Layer-Resolved Photoemission Signals in Determining the Absolute Coverage of Atomically Flat Metallic Thin Films D.-A. Luh, National Central University, Taiwan, C.-M. Cheng, K.-D. Tsuei, National Synchrotron Radiation Research Center, Taiwan |
| AS-TuP25 3-Dimensional XPS Imaging of Surface Nano-structures; A New Technique S. Tougaard, S. Hajati, University of Southern Denmark |