| AVS 61st International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Synthesis of Multilayered MgO/Ag/MgO Thin Films in the (001) and (111) Orientations by Pulsed Laser Deposition Daniel Velazquez, R. Seibert, Z. Yusof, L. Spentzouris, J. Terry, Illinois Institute of Technology |
| TF-ThP2 Development of CNT/Ni Composite Plated Films with Excellent Mechanical Properties Shoko Yamada, Aichi Institute of Technology, Japan, H. Ito, Aichi Institute of Technology, A. Matsumuro, Aichi Institute of Technology, Japan |
| TF-ThP3 Fabrication of Dispersed C60 Molecules/TiN Composite Film Using by Simultaneous Deposition Method with Both Heating Evaporation and Sputtering Yuki Ishiyama, A. Matsumuro, Aichi Institute of Technology, Japan |
| TF-ThP4 Improved Reflectance of M/Si Bilayers for Extreme Ultraviolet Lithography Reflective Mirror Chao-Te Lee, D. Chiang, P.-K. Chiu, H.-P. Chen, C.N. Hsiao, National Applied Research Laboratories, Taiwan, Republic of China |
| TF-ThP8 Characterization of Fluorine-doped Al2O3 Films Deposited by High-Power Impulse Magnetron Sputtering Bohuei Liao, Instrument Technology Research Center, Taiwan, Republic of China, C.N. Hsiao, ITRC, NARL, Taiwan, Republic of China, C.C. Lee, National Central University, Taiwan, Republic of China |
| TF-ThP9 Formation of ZnGaON Films Prepared by Two Types of co-Sputtering using ZnO or Zn Target and their Optical Properties Junichi Iwata, Y. Hirano, H. Sase, H. Katsumata, Meiji University, Japan |
| TF-ThP14 Growth and Characterization of Aluminum Oxide for M/I/S Junctions Zachary Barcikowski, University of Maryland, College Park, J. Pomeroy, National Institute of Standards and Technology (NIST) |
| TF-ThP15 Low–Temperature Thin Dielectric Films Obtained by ECR–CVD for Application in Non–Volatile Memories David Mateos, J.A. Diniz, University of Campinas, Brazil, S.N. Mestanza Muñoz, Federal University of ABC, Brazil, N. Nedev, M.A. Curiel Alvarez, Autonomous University of Baja California, Mexico, M. Mederos Vidal, Federal University of ABC, Brazil, B. Valdez, G. Montero, Autonomous University of Baja California, Mexico |
| TF-ThP16 MOCVD Growth of 2-D MgZnO Wurtzite Thin Films for Solar-blind Detector Applications Judith Reynolds, J.E. Rowe, L. Reynolds, D.E. Aspnes, North Carolina State University |
| TF-ThP17 Investigation of RF-sputtered Tin Sulfide Thin Films with In Situ and Post-Deposition Heating for Photovoltaic Applications R.E. Banai, Jacob Cordell, J.R. Nasr, R.E. Urena, N.J. Tanen, J.R.S. Brownson, M.W. Horn, Penn State University |
| TF-ThP19 Sputter-Deposited Carbon Fuses in Long-Term Digital Data Storage Jacob Bagley, H. Wang, A. Diwan, R.C. Davis, B. Lunt, M.R. Linford, Brigham Young University |
| TF-ThP20 Low Hydrogen Silicon Nitride Films Deposited by Plasma Enhanced Chemical Vapor Deposition Erica Douglas, A. Starbuck, C. DeRose, Sandia National Laboratories |
| TF-ThP21 Enhancing the Water Vapour Barrier Properties of Polymer Substrates with ALD Metal Oxide Films Karyn Jarvis, G. Griffiths, Australian Nuclear Science and Technology Organisation (ANSTO), Australia, L. Hyde, Melbourne Centre for Nanofabrication (MCN), Australia, P. Evans, G. Triani, Australian Nuclear Science and Technology Organisation (ANSTO), Australia |
| TF-ThP22 Sol-Gel Deposited TiO2 Thin Films for Propane Gas Sensors Ismael Garduño-Wilches, A. Maldonado Álvarez, CINVESTAV-IPN, México, D.R. Acosta-Najarro, Universidad Nacional Autonoma de México |
| TF-ThP23 Investigation of Optical Property and Crystalline of the Sliver Mirror in the 35 Krad Co-60 Radiation Environment Po-Kai Chiu, D. Chiang, C.T. Lee, Y.W. Lin, C.N. Hsiao, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China |
| TF-ThP25 Effect of Mg Doping Concentration on Resistance Switching Behavior of Oxygen Deficient Mg-doped Al2O3 Films Kyumin Lee, Y. Kim, T. Kim, H. Na, H. Sohn, Yonsei University, Korea |
| TF-ThP26 Failure of Semiclassical Models to Describe Resistivity Size Effect in sub 15nm Films. Daniel Yates, University of Central Florida, X. Liu, Carnegie Mellon University, D. Choi, Korea Railroad Research Institute, Republic of Korea, P. Schelling, University of Central Florida, K. Barmak, Columbia University, K.R. Coffey, University of Central Florida |