AVS 61st International Symposium & Exhibition
    Thin Film Thursday Sessions
       Session TF-ThP

Paper TF-ThP23
Investigation of Optical Property and Crystalline of the Sliver Mirror in the 35 Krad Co-60 Radiation Environment

Thursday, November 13, 2014, 6:00 pm, Room Hall D

Session: Thin Films Poster Session
Presenter: Po-Kai Chiu, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
Authors: P.-K. Chiu, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
D. Chiang, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
C.T. Lee, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
Y.W. Lin, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
C.N. Hsiao, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
Correspondent: Click to Email

This study investigated the optical design of silver mirror and effected of optical properties in the radiation environment. In different optical designed by Macleod software was studied in the same radiation environment. The optical properties were measured by the integrating sphere spectrophotometer and material properties by X-ray diffraction instrument. After the 35 Krad Co-60 radiation testing, the titanium dioxide film, silicon dioxide film, pure chromium and silver film could efficient reduce the damage of the B270 substrate by radiation. In the visible light, the titanium dioxide film had smaller spectral absorption about 0.5% at 450 nm and about 25 nm spectral drift. In the metal film,△T% in visible light of the sliver film was about 0.5% and chrome film about 1.5%. So, the radiation resistance of silver film was better than chrome film. By X-Ray diffraction analysis showed that the crystalline of silver film would be slightly improved by exposure to radiation.