| AVS 61st International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | Bohuei Liao, Instrument Technology Research Center, Taiwan, Republic of China |
| Authors: | B. Liao, Instrument Technology Research Center, Taiwan, Republic of China C.N. Hsiao, ITRC, NARL, Taiwan, Republic of China C.C. Lee, National Central University, Taiwan, Republic of China |
| Correspondent: | Click to Email |
Fluorine-doped Al2O3 films were deposited by high-power impulse magnetron sputtering with an Al metal target at room temperature. In order to obtain better optical and mechanical properties, films were investigated under different duty cycle and different ratios of O2 to CF4 gas. The optical properties in deep ultraviolet range, microstructure, surface roughness, and crystalline structure, of fluorine-doped Al2O3 films have been studied. The fluorine-doped Al2O3 films deposited with 45/555 duty cycle and 0.6 sccm CF4 has lowest extinction coefficient (5 × 10-4)and highest refractive index (1.70) at 193 nm. Besides, the fluorine-doped Al2O3 films reveal a dense and amorphous structure.