| AVS 53rd International Symposium | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-MoM1 Spatially Controlled Nano-Scale Doping of Er@sup 3+@ in Y@sub 2@O@sub 3@ by Atomic Layer Deposition J. Hoang, T.T. Van, M. Sawkar Mathur, University of California, Los Angeles, J. Bargar, Stanford Synchrotron Radiation Laboratory, B. Hoex, W.M.M. Kessels, M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands, R. Ostroumov, K. Wang, J.P. Chang, University of California, Los Angeles |
| 8:20am | TF-MoM2 MnO@sub 2@ and MgO Atomic Layer Deposition Using Bis(Ethylcyclopentadienyl) Precursors and H@sub 2@O B.B. Burton, F.H. Fabreguette, D.N. Goldstein, S.M. George, University of Colorado at Boulder |
| 8:40am | TF-MoM3 Invited Paper A New Fabrication Method of Nanostructural Materials by Using Selective Atomic Layer Deposition M.M. Sung, Hanyang University, South Korea |
| 9:20am | TF-MoM5 Mechanism of Al@sub 2@O@sub 3@ Atomic Layer Deposition Using Trimethylaluminum and Ozone D.N. Goldstein, S.M. George, University of Colorado at Boulder |
| 9:40am | TF-MoM6 Atomic Layer Deposition of Y@sub 2@O@sub 3@-Al@sub 2@O@sub 3@ Nanolaminate Thin Films and Compounds J.C. Rowland, M. Davidson, P.H. Holloway, University of Florida |
| 10:20am | TF-MoM8 Plasma Enhanced Atomic Layer Deposition of TiO@sub 2@ and HfO@sub 2@: Plasma Source Configuration and Film Properties S.M. Rossnagel, IBM T.J. Watson Research Center, J. Joo, Kunsan National University, Korea, H. Kim, POSTECH, Korea |
| 10:40am | TF-MoM9 Interface Properties of Hafnium Oxide Films Grown by Atomic Layer Deposition on Native, Chemical Oxide and H-Terminated Si Surfaces J.C. Hackley, L. Takacs, T. Gougousi, UMBC |
| 11:00am | TF-MoM10 Atomic Layer Deposition of Aluminium Silicate Films P.J. Evans, ANSTO, Australia, P.H. Mutin, Universite Montpellier, France, G. Triani, Z. Zhang, A. Atanacio, J. Bartlett, ANSTO, Australia |
| 11:20am | TF-MoM11 Structure and Electrical Properties of BN Atomic Layer Deposition Grown in a Quasi-static Viscous Flow Reactor R.K. Grubbs, Sandia National Laboratories |
| 11:40am | TF-MoM12 Plasma Controlled Atomic Layer Deposition for Sealing Pores in Low-k Materials Y.-B. Jiang, J.L. Cecchi, University of New Mexico, C.J. Brinker, Sandia National Laboratories |