| AVS 45th International Symposium | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:40pm | PS+MS-TuA3 Invited Paper Front End Integration for ULSI Technologies W.A. Mueller, SIEMENS Microelectronics, DRAM Development Alliance |
| 3:20pm | PS+MS-TuA5 Invited Paper Transient Diffusion Effects in Silicon Technology C.S. Rafferty, Bell Laboratories, Lucent Technologies |
| 4:00pm | PS+MS-TuA7 Invited Paper Technology Requirements for Logic ICs M. Brillouët, France Telecom |
| 4:40pm | PS+MS-TuA9 Invited Paper Advanced Deep-UV and 193 nm Optical Lithography: The Role of Resists, Reflectivity Control and Resolution Enhancement Technologies O. Nalamasu, R.A. Cirelli, G.P. Watson, Bell Laboratories, Lucent Technologies |