| AVS 54th International Symposium | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Ferroelectric Properties of PbMn1/3Nb2/3O3-Pb(Zr,Ti)O3 Thin Films Epitaxially Grown on (001)MgO Substrates K. Wasa, I. Kanno, H. Kotera, Kyoto University, Japan, T. Zhang, F. Li, S.-Y. Zhang, Nanjing University, China |
| TF-ThP2 (Dual) Ion Beam Deposition of Tantalum Pentoxide Thin Film at Room Temperature W. Kulisch, D. Gilliland, G. Ceccone, H. Rauscher, L. Sirghi, P. Colpo, F. Rossi, Joint Research Center, Italy |
| TF-ThP3 Characterization of Hafnium Nitride Films Deposited by Plasma ALD N. Singh, Oxford Instruments Plasma Technology, UK |
| TF-ThP4 Al-doped ZnO (AZO) Films Deposited by Gas Flow Sputtering for Transparent Conductive Thin Films H. Takeda, Aoyama Gakuin University, Japan, Y. Iwabuchi, M. Yoshikawa, Bridgestone Corporation, Japan, Y. Sato, Y. Shigesato, Aoyama Gakuin University, Japan |
| TF-ThP5 Annealing and Manganese Activated Electroluminescent Characteristics of Thin Film Gallium Oxide J.H. Heo, J.H. Kim, Chungbuk National University, Korea |
| TF-ThP6 Effects of Manganese Oxide-Mixed Abrasive Slurry on the Tetra-Ethyl Ortho-Silicate Oxide Chemical Mechanical Polishing for Planarization of Inter-Layer Dielectric film in the Multilevel Interconnection S.-W. Park, W.-S. Lee, Chosun University, Korea, Y.-J. Seo, Daebul University, Korea, G.-W. Choi, S.-J. Han, Y.-K. Lee, Chosun University, Korea |
| TF-ThP7 The Role of Nitrogen Composition in SiOxNy as Diffusion-Barrier Film Deposited by NH3/SiH4/Ar Plasma Enhanced Chemical Vapor Depositon P. Thuy, J.H. Lee, I.K. Kim, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| TF-ThP8 Low-Temperature Formation of Polycrystalline Silicon Thin Films via Enhanced Aluminum-Induced Crystallization F.W. DelRio, J. Lai, T.-J. King Liu, R. Maboudian, University of California Berkeley |
| TF-ThP10 Thermally Stable Ag Thin Film Structure Modified with Very Thin Al Layers M. Kawamura, Y. Inami, Y. Abe, K. Sasaki, Kitami Institute of Technology, Japan |
| TF-ThP11 Transmission Infrared Characterization of Titanium Oxide Thin Films Deposited by Atomic Layer Deposition B.-C. Kang, Sungkyunkwan University, Rep. of Korea |
| TF-ThP12 Fabrication of CdS-based Visible Light Photocatalyst by the Use of Ammonia-Free Chemical Bath Deposition Technique S. Biswas, M.F. Hossain, T. Takahashi, University of Toyama, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |
| TF-ThP13 Study of Sol-Gel Derived TiO2 Photoelectrode for the Fabrication of Low Cost Dye-Sensitized Solar Cells M.F. Hossain, S. Biswas, T. Takahashi, University of Toyama, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |
| TF-ThP14 Optimization of Sputter-Deposited TiO2 Photo-Electrode for Dye-Sensitized Solar Cell M.F. Hossain, S. Biswas, T. Takahashi, University of Toyama, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |
| TF-ThP15 Micro Structure Control of RuO2 Nanoparticle Deposition on CNTs by Cyclic Voltammetry Method H.-M. Wu, Chinese Culture University, Taiwan, W.-T. Hong, Institute of Materials Science and Nanotechnology, Taiwan, L.-C. Chen, National Taiwan University |
| TF-ThP16 Porosity Analysis on Supported Thin Nanoporous Films K.J. Chao, National Tsinghua University, Taiwan |
| TF-ThP17 Silicon Carbonitrides: On the Attainability of Stable Compounds with High Nitrogen Content M. Bruns, Forschungszentrum Karlsruhe, Germany, M. Rudolphi, H. Baumann, Frankfurt University, Germany, U. Geckle, Forschungszentrum Karlsruhe GmbH, Germany |
| TF-ThP18 New Method to Correlate Crystalline Orientation and Sputtering rate of Tantalum C.-F. Lo, Praxair Surface Technologies - MRC |
| TF-ThP19 Combinatorial Thin Film Synthesis of Cerium Doped Lutetium Silicate (Lu2SiO5) Scintillation Materials J.D. Peak, C.L. Melcher, P.D. Rack, University of Tennessee |
| TF-ThP20 Electrochoromic Properties of Mg-doped Nickel Oxide Films Deposited by rf Magnetron Sputtering H. Sugawara, Aoyama Gakuin University, Japan, I. Yamamoto, Nissan Motor Co., Ltd., Japan, Y. Sato, Y. Shigesato, Aoyama Gakuin University, Japan |
| TF-ThP21 Structural Characterization and Electronic Work Function of Pt-Ru Alloy Thin Films A.P. Warren, R.M. Todi, B. Yao, K.B. Sundaram, University of Central Florida, K. Barmak, Carnegie Mellon University, K.R. Coffey, University of Central Florida |
| TF-ThP22 The Importance of the Valence State of Cu in the Formation of Re-BCO using Low Pressure dc-Magnetron Sputtering K. Smet, R. De Gryse, University Ghent, Belgium |
| TF-ThP23 Chemical Mechanical Polishing Characteristics of ITO Thin Film Prepared by RF Magnetron Sputtering G.-W. Choi, W.-S. Lee, Chosun University, Korea, Y.-J. Seo, Daebul University, Korea, S.-W. Park, S.-J. Han, Chosun University, Korea |
| TF-ThP24 Effect of Plasma Induced Substrate Temperature Rise on AZO Thin Film Properties in ICP Assisted Bipolar Pulsed dc Magnetron Sputtering W.K. Yang, J.H. Joo, Kunsan National University, Korea |
| TF-ThP25 Effect Of Sodium Addition On Cu-Poor CIGS2 Thin Film Solar Cells P.S. Vasekar, N.G. Dhere, Florida Solar Energy Center |
| TF-ThP26 Surface Modification of Polytetrafluoroethylene by Copper Ion Implantation K.-W. Weng, Mingdao University, Taiwan, S. Han, National Taichung Institute of Technology, Taiwan, Y.-C. Chen, National Chung Hsing University, Taiwan, D.-Y. Wang, Mingdao University, Taiwan |