| AVS 54th International Symposium | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Aspects of Thin Films Poster Session |
| Presenter: | H.-M. Wu, Chinese Culture University, Taiwan |
| Authors: | H.-M. Wu, Chinese Culture University, Taiwan W.-T. Hong, Institute of Materials Science and Nanotechnology, Taiwan L.-C. Chen, National Taiwan University |
| Correspondent: | Click to Email |
The deposition and surface morphology of RuO2 on carbon nanotubes (CNTs) are crucial for the optimal capacitive performance of RuO2/CNTs composite supercapacitors. We investigate the effect of annealing and pulse voltage control on the microstructure of RuO2 nanoparticles during cyclic voltammetry deposition. The results have shown that the capacitance RuO2/CNTs was remarkably achieved to 225 mF/cm2 after annealed at 200? for 2 hours, and 125 mF/cm2 by applying 2 sec on time/ 5 sec off time pulse voltage for half hour, at scan rate 50 mv/sec. The micro texture of RuO2 on CNTs surface was found strongly affected by deposition condition and play a key rule of the capacitive performance.