| AVS 54th International Symposium | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Aspects of Thin Films Poster Session |
| Presenter: | K.-W. Weng, Mingdao University, Taiwan |
| Authors: | K.-W. Weng, Mingdao University, Taiwan S. Han, National Taichung Institute of Technology, Taiwan Y.-C. Chen, National Chung Hsing University, Taiwan D.-Y. Wang, Mingdao University, Taiwan |
| Correspondent: | Click to Email |
Polytetrafluorethylene (PTFE) was implanted copper by a hybrid metal plasma ion implantation (MPII) with varying ion dose. X-ray photoelectron spectroscopy (XPS) was used for the characterization of chemical structures in the ion-implanted assembly, while scanning electron microscopy (SEM) was used for the characterization of morphology. Five chemical bonds, CF3, CF2, CF, C-O, and elemental carbon bonds, were observed on the surface of the ion-implanted assembly. Numerous microfibers were observed on the ion-irradiated surface. Water contact angle of the ion-implanted samples increased gradually with increasing ion dose, and reached a maximum value of 103.50 on the surface of the sample implanted with ion dose of 3 × 1017 ion/cm2. The decrease of microhardness at high ion dose was resulted, accounted for radiation damage. Wear resistance and resistance were also discussed in the copper modified surface.