AVS 65th International Symposium & Exhibition
    Advanced Ion Microscopy Focus Topic Thursday Sessions

Session HI+AS-ThM
Advanced Ion Microscopy & Surface Analysis

Thursday, October 25, 2018, 8:00 am, Room 203B
Moderators: Gregor Hlawacek, Helmholtz Zentrum Dresden-Rossendorf, Germany, Shida Tan, Intel Corporation


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Click a paper to see the details. Presenters are shown in bold type.

8:00am HI+AS-ThM1 Invited Paper
Pushing the Limits: Secondary Ion Mass Spectrometry with Helium Ion Microscopy
Alex Belianinov, Oak Ridge National Laboratory, S. Kim, Pusan National University, South Korea, M. Lorenz, University of Tennessee Knoxville, A.V. Ievlev, A. Trofimov, O.S. Ovchinnikova, Oak Ridge National Laboratory
8:40am HI+AS-ThM3
When HIM meets SIMS
Tom Wirtz, Luxembourg Institute of Science and Technology (LIST), Luxembourg, O. De Castro, J. Lovric, Luxembourg Institute of Science and Technology (LIST), J.-N. Audinot, Luxembourg Institute of Science and Technology (LIST), Luxembourg
9:00am HI+AS-ThM4
Deciphering Chemical Nature of Ferroelastic Twin Domain in MAPbI3 perovskite by Helium Ion Microscopy Secondary Ion Mass Spectrometry
Yongtao Liu, University of Tennessee, L. Collins, Oak Ridge National Laboratory, R. Proksch, Asylum Research an Oxford Instruments Company, S. Kim, Oak Ridge National Laboratory, B.R. Watson, University of Tennessee, B.L. Doughty, Oak Ridge National Laboratory, T.R. Calhoun, M. Ahmadi, University of Tennessee, A.V. Ievlev, S. Jesse, S. Retterer, A. Belianinov, K. Xiao, J. Huang, B.G. Sumpter, S.V. Kalinin, Oak Ridge National Laboratory, B.H. Hu, University of Tennessee, O.S. Ovchinnikova, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory
9:20am HI+AS-ThM5 Invited Paper
Helium and Neon Ion Microscopy for Microbiological Applications
Ilari Maasilta, University of Jyvaskyla, Finland
11:00am HI+AS-ThM10
Characterization of Soot Particles by Helium Ion Microscopy
André Beyer, D. Emmrich, M. Salamanca, L. Ruwe, H. Vieker, K. Kohse-Höinghaus, A. Gölzhäuser, Bielefeld University, Germany
11:20am HI+AS-ThM11
Development of a Surface Science Spectra Submission Form for Low Energy Ion Scattering (LEIS)
M.R. Linford, Tahereh Gholian Avval, Brigham Young University, H.H. Brongersma, T. Grehl, IONTOF GmbH, Germany
11:40am HI+AS-ThM12
Time of Flight Backscatter and Secondary Ion Mass Spectrometry in the Helium Ion Microscope
Nico Klingner, R. Heller, G. Hlawacek, J. von Borany, S. Facsko, Helmholtz Zentrum Dresden-Rossendorf, Germany
12:00pm HI+AS-ThM13
Helium and Neon Focused Ion Beam Hard Mask Lithography on Atomic Layer Deposition Films
Matthew Hunt, California Institute of Technology, J. Yang, University of Texas at Austin, S.A. Wood, O.J. Painter, California Institute of Technology