AVS 65th International Symposium & Exhibition | |
Advanced Ion Microscopy Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | HI+AS-ThM1 Invited Paper Pushing the Limits: Secondary Ion Mass Spectrometry with Helium Ion Microscopy Alex Belianinov, Oak Ridge National Laboratory, S. Kim, Pusan National University, South Korea, M. Lorenz, University of Tennessee Knoxville, A.V. Ievlev, A. Trofimov, O.S. Ovchinnikova, Oak Ridge National Laboratory |
8:40am | HI+AS-ThM3 When HIM meets SIMS Tom Wirtz, Luxembourg Institute of Science and Technology (LIST), Luxembourg, O. De Castro, J. Lovric, Luxembourg Institute of Science and Technology (LIST), J.-N. Audinot, Luxembourg Institute of Science and Technology (LIST), Luxembourg |
9:00am | HI+AS-ThM4 Deciphering Chemical Nature of Ferroelastic Twin Domain in MAPbI3 perovskite by Helium Ion Microscopy Secondary Ion Mass Spectrometry Yongtao Liu, University of Tennessee, L. Collins, Oak Ridge National Laboratory, R. Proksch, Asylum Research an Oxford Instruments Company, S. Kim, Oak Ridge National Laboratory, B.R. Watson, University of Tennessee, B.L. Doughty, Oak Ridge National Laboratory, T.R. Calhoun, M. Ahmadi, University of Tennessee, A.V. Ievlev, S. Jesse, S. Retterer, A. Belianinov, K. Xiao, J. Huang, B.G. Sumpter, S.V. Kalinin, Oak Ridge National Laboratory, B.H. Hu, University of Tennessee, O.S. Ovchinnikova, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory |
9:20am | HI+AS-ThM5 Invited Paper Helium and Neon Ion Microscopy for Microbiological Applications Ilari Maasilta, University of Jyvaskyla, Finland |
11:00am | HI+AS-ThM10 Characterization of Soot Particles by Helium Ion Microscopy André Beyer, D. Emmrich, M. Salamanca, L. Ruwe, H. Vieker, K. Kohse-Höinghaus, A. Gölzhäuser, Bielefeld University, Germany |
11:20am | HI+AS-ThM11 Development of a Surface Science Spectra Submission Form for Low Energy Ion Scattering (LEIS) M.R. Linford, Tahereh Gholian Avval, Brigham Young University, H.H. Brongersma, T. Grehl, IONTOF GmbH, Germany |
11:40am | HI+AS-ThM12 Time of Flight Backscatter and Secondary Ion Mass Spectrometry in the Helium Ion Microscope Nico Klingner, R. Heller, G. Hlawacek, J. von Borany, S. Facsko, Helmholtz Zentrum Dresden-Rossendorf, Germany |
12:00pm | HI+AS-ThM13 Helium and Neon Focused Ion Beam Hard Mask Lithography on Atomic Layer Deposition Films Matthew Hunt, California Institute of Technology, J. Yang, University of Texas at Austin, S.A. Wood, O.J. Painter, California Institute of Technology |