AVS 65th International Symposium & Exhibition
    Advanced Ion Microscopy Focus Topic Thursday Sessions
       Session HI+AS-ThM

Invited Paper HI+AS-ThM1
Pushing the Limits: Secondary Ion Mass Spectrometry with Helium Ion Microscopy

Thursday, October 25, 2018, 8:00 am, Room 203B

Session: Advanced Ion Microscopy & Surface Analysis
Presenter: Alex Belianinov, Oak Ridge National Laboratory
Authors: A. Belianinov, Oak Ridge National Laboratory
S. Kim, Pusan National University, South Korea
M. Lorenz, University of Tennessee Knoxville
A.V. Ievlev, Oak Ridge National Laboratory
A. Trofimov, Oak Ridge National Laboratory
O.S. Ovchinnikova, Oak Ridge National Laboratory
Correspondent: Click to Email
Material functionality is defined by structure and chemistry often at micro- and nano-scale. The effects are coupled; however, few methods exist that can simultaneously map both. This presents a challenge for material scientists. Functional materials are continuously increasing in complexity, and the number of studies devoted to designing new materials often overwhelms characterization capacity. Recently, attention has been devoted to offer hardware and software solutions in chemical imaging, where a blend of in-situ and ex-situ techniques are used to capture and describe material behavior using combinatorial data. However, many of the emerging techniques need to be carefully validated and contrasted against existing approaches.

This talk will cover the performance of the recently developed combinatorial Helium Ion Microscopy (HIM) and Secondary Ion Mass Spectrometry (SIMS) tool on a wide variety of conductive and insulating samples. While the HIM imaging and milling performance to explore the physical structure has been repeatedly demonstrated, questions on the effect, quality, and resolution of a Neon beam SIMS remain. Ion yields, chemical resolution, and charge compensation results and strategies will be presented and discussed.

Acknowledgement

This research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility.