| AVS 65th International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:20pm | EL+EM-MoA1 Invited Paper The Physics of Low Symmetry Metal Oxides with Special Attention to Phonons, Plasmons and Excitons and their Potential for Uses in Power Electronics and Quantum Technologies Mathias Schubert, University of Nebraska - Lincoln, Linköping University, Sweden, Leibniz Institute for Polymer Research, Dresden, Germany, A. Mock, R. Korlacki, S. Knight, University of Nebraska - Lincoln, V. Darakchieva, Linköping University, Sweden, B. Monemar, Linköping University, Sweden, Tokyo University of Agriculture and Tech., Japan, H. Murakami, Y. Kumagai, Tokyo University of Agriculture and Technology, Japan, K. Goto, Tokyo University of Agriculture and Technology, Tamura Corporation, Japan, M. Higashiwaki, National Institute of Information and Communications Technology, Japan |
| 2:00pm | EL+EM-MoA3 Mueller Matrix Spectroscopic Ellipsometry Based Scatterometry of Nanowire Gate-All-Around (GAA) Transistor Structures M. Korde, Alain C. Diebold, SUNY Polytechnic Institute |
| 2:20pm | EL+EM-MoA4 Anomaly in the Optical Constants of Ni near the Curie Temperature Farzin Abadizaman, S. Zollner, New Mexico State University |
| 2:40pm | EL+EM-MoA5 Phonon Confinement and Excitonic Absorption in the Optical Properties of ZnO Films Nuwanjula Samarasingha, S. Zollner, New Mexico State University, D. Pal, A. Mathur, A. Singh, R. Singh, S. Chattopadhyay, Indian Institute of Technology Indore, India |
| 3:00pm | EL+EM-MoA6 High Aspect Ratio Etch Tilt Detection with Full 4x4 Mueller Matrix Spectroscopic Ellipsometry and Its Application to 3DNAND Channel Hole Etch Process and Chamber Monitoring P. Ong, Micron Semiconductor Asia Pte. Ltd., Singapore, Shilin Ng, Nanometrics Incorporated, G.B. Chu, Micron Semiconductor Asia Pte. Ltd., Singapore, P. Murphy, Nanometrics Incorporated, L.C. Liong, W. Fu, Micron Semiconductor Asia Pte. Ltd., Singapore, Y. Wen, Nanometrics Incorporated, L.W. Ho, Micron Semiconductor Asia Pte. Ltd., Singapore |
| 3:40pm | EL+EM-MoA8 Ultra-High-Speed Spectroscopic Ellipsometry and its Applications Gai Chin, ULVAC Inc., Japan |
| 4:00pm | EL+EM-MoA9 Use of Ellipsometry to Monitor Implant Damage in Methane Plasma Implant Nicholas Bateman, Varian Semiconductor Equipment, Applied Materials |
| 4:20pm | EL+EM-MoA10 Study of the Thickness-dependent Optical Constants of Metallic Thin Films based on Ellipsometry and Reflectivity Jiamin Liu, H. Jiang, S.Y. Liu, Huazhong University of Science and Technology, China |