| AVS 65th International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Monday Sessions |
| Session EL+EM-MoA |
| Session: | Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches |
| Presenter: | Gai Chin, ULVAC Inc., Japan |
| Correspondent: | Click to Email |
As a comprehensive manufacturer of metrology tools and deposition tools, ULVAC developed an innovative high-speed spectroscopic ellipsometer for some thin-film deposition applications, such as PVD, CVD, ALD and others.
This novel spectroscopic ellipsometry can measure the thickness and optical constants of thin films at a dramatically fast speed. Its data acquisition time is as short as 10ms. It does not require any active components for polarization-control, such as a rotating compensator or an electro-optical modulator. The Fourier analysis of channeled spectrum obtained from the spectrometer allows determining the four spectroscopic ellipsometry parameters of the samples simultaneously.
It created great opportunities for new applications of the spectroscopic ellipsometry in which the compactness, the simplicity and the rapid response are extremely important. It can be integrated into the deposition tool and successfully measured thin films in-situ to realize the Advanced Process Control (APC). Obviously, those from PVD, CVD and ALD are some promising applications for this novel spectroscopic ellipsometry.
This paper describes the principle, system configuration and creative efforts on developing a series of high-speed spectroscopic ellipsometers. Some of its new applications will be also introduced, such as the PVD, CVD, ALD, EUV, OLED, MEMS and some measurement data of thin films from the semiconductor, flat panel display and other industries.