| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS+TF+VT-FrM1 Surface and Interface Analyses by X-ray Absorption and Hard X-ray Photoemission Spectroscopies Q. Xiao, X. Cui, Canadian Light Source, Canada, H. Piao, General Electric Global Research Center, Y.F. Hu, Canadian Light Source, Canada, T.K. Sham, The University of Western Ontario, Canada |
| 8:40am | AS+TF+VT-FrM2 Differences in the Electronic Structure Highly-Oriented Films of H2-, Fe-, Co-, and Cu-Phthalocyanines Revealed by NEXAFS Spectroscopy T.M. Willey, M. Bagge-Hansen, J.R.I. Lee, R. Call, L. Landt, T. van Buuren, Lawrence Livermore National Laboratory, C. Colesniuc, C.M. Monton, I. Schuller, University of California, San Diego |
| 9:00am | AS+TF+VT-FrM3 Invited Paper Hard X-ray Photoelectron Study of Graphene/ h-BN Layer Structures Grown on Polycrystalline Cu Substrates L. Kövér, MTA ATOMKI, Hungary, L. Tapasztó, Inst. Tech. Physics and Materials Sci. & Korea-Hungary Joint Lab for Nanosciences, Hungary, C. Hwang, KRISS & Korea-Hungary Joint Lab for Nanosciences, Republic of Korea, L.P. Biró, Inst. Tech. Physics and Materials Sci. & Korea-Hungary Joint Lab for Nanosciences, Hungary, I. Cserny, J. Tóth, A. Csik, MTA ATOMKI, Hungary, W. Drube, S. Thiess, Deutsches Elektronen-Synchrotron DESY, Germany |
| 9:40am | AS+TF+VT-FrM5 Beyond Hard X-ray Photoelectron Spectroscopy: Simultaneous Combination with X-ray Diffraction G.R. Castro, J. Rubio-Zuazo, SpLine at the European Synchrotron Radiation Facility, France |
| 10:00am | AS+TF+VT-FrM6 Spectroscopic Imaging using Vector Potential Photoelectron Microscopy R. Browning, R. Browning Consultants |
| 10:20am | AS+TF+VT-FrM7 Trends in Synchrotron-based Photoemission; High Energy and High Pressure H.J. Bergersen, J. Åhlund, R. Moberg, VG Scienta, Sweden |