| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Friday Sessions |
| Session AS+TF+VT-FrM |
| Session: | Surface Analysis using Synchrotron Techniques |
| Presenter: | Y.F. Hu, Canadian Light Source, Canada |
| Authors: | Q. Xiao, Canadian Light Source, Canada X. Cui, Canadian Light Source, Canada H. Piao, General Electric Global Research Center Y.F. Hu, Canadian Light Source, Canada T.K. Sham, The University of Western Ontario, Canada |
| Correspondent: | Click to Email |
Synchrotron-based techniques, such as X-ray absorption spectroscopy (XAS) and variable energy X-ray photoemission spectroscopy (XPS) are increasingly applied to the characterization of surfaces and interfaces of advanced materials. This presentation will introduce the XAS and variable energy XPS capabilities in the study of thin films and nanomaterials at the Canadian Light Source—the third generation synchrotron in Canada. Advantages of these techniques over the conventional techniques (such as lab-based XPS) will be demonstrated using examples in studies of two types of materials: (1) Gate oxide development on SiC and (2) heterogeneous nanocatalysts. In particular, examples using the recently commissioned high energy XPS at the SXRMB beamline (up to 10 KeV) will be highlighted.