AVS 59th Annual International Symposium and Exhibition
    Applied Surface Science Friday Sessions
       Session AS+TF+VT-FrM

Invited Paper AS+TF+VT-FrM3
Hard X-ray Photoelectron Study of Graphene/ h-BN Layer Structures Grown on Polycrystalline Cu Substrates

Friday, November 2, 2012, 9:00 am, Room 20

Session: Surface Analysis using Synchrotron Techniques
Presenter: L. Kövér, MTA ATOMKI, Hungary
Authors: L. Kövér, MTA ATOMKI, Hungary
L. Tapasztó, Inst. Tech. Physics and Materials Sci. & Korea-Hungary Joint Lab for Nanosciences, Hungary
C. Hwang, KRISS & Korea-Hungary Joint Lab for Nanosciences, Republic of Korea
L.P. Biró, Inst. Tech. Physics and Materials Sci. & Korea-Hungary Joint Lab for Nanosciences, Hungary
I. Cserny, MTA ATOMKI, Hungary
J. Tóth, MTA ATOMKI, Hungary
A. Csik, MTA ATOMKI, Hungary
W. Drube, Deutsches Elektronen-Synchrotron DESY, Germany
S. Thiess, Deutsches Elektronen-Synchrotron DESY, Germany
Correspondent: Click to Email

Graphene-hexagonal BN layer structures are recently in the focus of interest having a great potential importance as promising candidates to be utilized in many electronic and spintronic ultrathin device applications. Hard X-ray photoelectron spectroscopy (HAXPES) based on application of synchrotron radiation for excitation is a useful tool for revealing multilayer structures nondestructively providing information on the chemical state of the components at the surface and (even in the case of deeply embedded) interface layers. The aim of the present study is to test the applicability of the HAXPES method for characterizing graphene-hexagonal BN layer systems. h-BN and single layer graphene/multilayer h-BN structures were grown on polycrystalline Cu substrates using the Chemical Vapor Deposition technique [1]. HAXPES measurements were performed at the BW2 beamline of the DORIS III synchrotron at DESY using the Tunable High Energy XPS facility [2] and monochromatic photons of 3000 eV energy. The surface layer structure of the same samples were also studied with conventional XPS in ATOMKI using non-monochromated Al Kα radiation [3]. For obtaining information on the order and relative depth of the particular layers the dependence of the XPS and HAXPES spectra on the angle of emission of photoelectrons was also studied. Our results demonstrate the advantage of the combination of XPS and HAXPES measurements, the use of the Auger parameter for identifying the chemical state of the components at the interface between the layer structure and the substrate, the removal of the overlap between the Auger spectra from the substrate and the photoelectron spectra of the overlayer structure in the HAXPES spectra. In addition, HAXPES, due to the high energy resolution and sensitivity applied, makes possible the separation and identification of the contributions from atoms in different chemical states to photoelectron peaks of the components of the layer structure, and the quantitative estimation of their relative intensity, even at near grazing photon beam incidence (high surface sensitivity).
The research leading to these results has received funding from the European Community's Seventh Framework Programme (FP7/2007-2013) under grant agreement n° 312284, by OTKA grants PD 84244, K 101599 and in the framework of the Korea- Hungary Joint Laboratory for Nanosciences.
[1] C. Hwang, K. Yoo, S.J. Kim, E.K. Seo, H. Yu, L.P. Biro, J. Phys. Chem. C 115, 22369 (2011)
[2] W. Drube, T. M. Grehk, R. Treusch and G. Materlik, J. Electron Spectrosc. Relat. Phenom. 88-91, 683 (1998).
[3] L. Kövér, D. Varga, I. Cserny, J. Tóth, K. Tőkési, Surf. Interface Anal. 19, 9 (1992).