| AVS 53rd International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-ThP2 Numerical Analysis of Oxygen Positive Column in Atmospheric Pressure Glow Discharge Plasmas Y. Ichikawa, T. Suzawa, M. Narita, Fuji Electric Device Technology, Japan |
| PS-ThP3 A New Production Method of Negative-Ion-Plasma in an Extremely High Dielectric-Constant Discharge Tube K. Kusaba, Tokai University, Japan, Y. Ikeda, KYOCERA Co. LTD., Japan, K. Shinohara, Japan High Frequency Co., LTD, H. Shindo, Tokai University, Japan |
| PS-ThP4 Spectroscopic Study of Fluorocarbon Plasma Gas Phase Chemistries in High Density Plasma for a Submicron Contact Hole Etching G.H. Kim, ETRI, Korea, K.T. Kim, C.I. Kim, Chung-Ang University, Korea, S.G. Kim, ETRI, Korea, J.G. Koo, ETRI, T.M. Roh, J.D. Kim, ETRI, Korea |
| PS-ThP5 Electron Density and Electron Temperature of Narrow-Gap RF Plasma Polymerization System Measured by Highly-Sensitive Double Surface Wave Probe Technique K. Kinoshita, MIRAI-ASET, Japan, K. Nakamura, O. Hirano, Chubu University, Japan, Y. Hyodo, MIRAI-ASET, Japan, O. Kiso, MIRAI-ASRC, AIST, Japan, J. Kawahara, MIRAI-ASET, Japan, Y. Hayashi, NEC, Japan, S. Saito, Selete, Japan, H. Sugai, Nagoya University, Japan, T. Kikkawa, Hiroshima University, Japan |
| PS-ThP6 Predicting Ion Energy Distribution Function for Multi-Frequency Capacitive Discharges A. Wu, M.A. Lieberman, J.P. Verboncoeur, A.J. Lichtenberg, University of California, Berkeley |
| PS-ThP7 A Transmission Line Microwave Interferometer for Monitoring of Electron Density in Plasma Processing Tools C.H. Chang, J.Y. Jeng, C. Lin, K.C. Leou, National Tsing Hua University, ROC |
| PS-ThP8 Floating Probe for Electron Temperature and Ion Density Measurement Applicable to Processing Plasmas C.W. Chung, Hanyang University, South Korea |
| PS-ThP9 EEPF Measurement in SF6/O2 and CF4/O2 Gas Mixture Capacitively Coupled Plasma S.K. Ahn, S.J. You, H.-Y. Chang, Korea Advanced Institute of Science and Technology, Republic of Korea |
| PS-ThP10 Optical Emission Measurements of Dual Frequency Capacitively Coupled Plasmas E.C. Benck, K.L. Steffens, National Institute of Standards and Technology |
| PS-ThP11 Anisotropic Deposition of Cu with a Plasma CVD Reactor Equipped with a High Power ICP H Source M. Shiratani, J. Umetsu, S. Iwashita, K. Koga, Kyushu University, Japan |
| PS-ThP12 Characteristics of Inductively Coupled Plasma Using Internal Multiple U-type Antenna for Ultra Large-area FPD Processing J.H. Lim, K.N. Kim, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-ThP14 New Method for Measurement of Electron Temperature using Wave Cutoff Frequency and Wave Absorption Frequency in Plasmas J.H. Kim, D.-J. Seong, Y.H. Shin, Korea Research Institute of Standards and Science |
| PS-ThP15 Measurements of Cu Densities at the Ground and Metastable States in a Magnetron Sputtering Plasma Source with a Cu Target K. Sasaki, J.-S. Gao, N. Nafarizal, H. Toyoda, S. Iwata, T. Kato, S. Tsunashima, H. Sugai, Nagoya University, Japan |