AVS 53rd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS-ThP

Paper PS-ThP12
Characteristics of Inductively Coupled Plasma Using Internal Multiple U-type Antenna for Ultra Large-area FPD Processing

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: High Pressure Discharges and Novel Diagnostics & Sources Poster Session
Presenter: J.H. Lim, Sungkyunkwan University, Korea
Authors: J.H. Lim, Sungkyunkwan University, Korea
K.N. Kim, Sungkyunkwan University, Korea
G.Y. Yeom, Sungkyunkwan University, Korea
Correspondent: Click to Email
Inductively coupled plasmas (ICP) have been investigated for the processing of various materials as one of the high density (1011~1012 cm@super -3@) and low gas pressure plasma sources. But this ICP source have some problems in the processing of large-area, due to the cost and thickness of its dielectric material and the large impedance of the antenna when scaling up to large areas. However, by inserting an antenna into the plasma, more production applicable large-area ICP is feasible due to the induction of a strong electric field in the plasma and the efficient power transmission to the plasma. In this work, an internal-type antenna (multiple U-type antenna) was used as a large-area (2,300 mm x 2000 mm) inductively coupled plasma (ICP) source. Characteristics of the plasma were measured using a Langmuir probe located on the sidewall of the chamber and the use of the multiple U-type antenna showed higher plasma density. Electrical properties of multiple U-type antenna were measured by impedance analyzer. By changing the antenna arrangement and distance of antenna array, the uniformity of the plasma has changed significantly. By optimizing the antenna arrangement, the plasma uniformity less than 10% could be also obtained within the substrate area.