AVS 53rd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS-ThP

Paper PS-ThP10
Optical Emission Measurements of Dual Frequency Capacitively Coupled Plasmas

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: High Pressure Discharges and Novel Diagnostics & Sources Poster Session
Presenter: E.C. Benck, National Institute of Standards and Technology
Authors: E.C. Benck, National Institute of Standards and Technology
K.L. Steffens, National Institute of Standards and Technology
Correspondent: Click to Email
Dual frequency capacitively coupled plasma sources are becoming increasingly important in semiconductor manufacturing processes. An imaging spectrometer combined with a high speed intensified CCD camera was used to obtain spatially and temporally resolved measurements of the optical emission from dual frequency (2 MHz & 13.56 MHz or 2 MHz & 27.12 MHz) plasmas created in a Gaseous Electronics Conference (GEC) reference reactor. The vertical distribution of the argon 750.4 nm transition was measured at the center of the discharge. Significant changes in the temporal and vertical optical emission distributions were observed with changing feed gas (Ar, CF@sub 4@, and O@sub 2@) and gas pressure (100 mT to 1000 mT). The temporal distributions were insensitive to the amplitude of the lower frequency voltage. Changing from a single powered electrode to two separate powered electrodes also had a significant impact on the time resolved optical emission.