AVS 53rd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS-ThP

Paper PS-ThP8
Floating Probe for Electron Temperature and Ion Density Measurement Applicable to Processing Plasmas

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: High Pressure Discharges and Novel Diagnostics & Sources Poster Session
Presenter: C.W. Chung, Hanyang University, South Korea
Correspondent: Click to Email
A floating type probe(FP) and its driving circuit using the nonlinear characteristics of the probe sheath was developed and the electron temperature and the plasma density which is found from ion part of the probe characteristic(ion density) were measured in inductively coupled plasmas(ICP). The FP was compared with a single Langmuir probe and it turned out that the FP agrees closely with the single probe at various rf powers and pressures. The ion density and electron temperature by the FP were measured with a film on the probe tip coated in CF@super 4@ plasma. It is found that the ion density and electron temperature by the FP were almost the same regardless of the coating on the probe tip while a single Langmuir probe does not work. Because the floating type probe is hardly affected by the deposition on the probe tip, it is expected to be applied to plasma diagnostics for plasma processing such as deposition or etching.