AVS 53rd International Symposium
    Plasma Science and Technology Monday Sessions

Session PS-MoA
Manufacturing and Scientific Challenges for Plasma Processing at 32 nm

Monday, November 13, 2006, 2:00 pm, Room 2009
Moderator: S. Shankar, Intel

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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS-MoA1 Invited Paper
Core Technologies for The Transition from Si Technology to Nano-technology
H. Watanabe, Semiconductor Leading Edge Technologies, Inc. (Selete), Japan
2:40pm PS-MoA3 Invited Paper
Patterning Technology for Sub-50 nm Memory Devices
C.-J. Kang, SAMSUNG Electronics, Korea