| AVS 52nd International Symposium | |
| Manufacturing Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| MS-TuP1 Dip-Pen Nanolithography-Based Fabrication of ZnO Microarrays I. Takahiro, I. Kaoru, S. Nagahiro, T. Osamu, Nagoya University, Japan |
| MS-TuP2 The Dependence of Power Trench MOSFET Processes on Wafer Thickness M. Daggubati, G. Sim, D. Long, H. Paravi, Q. Wang, Fairchild Semiconductor |
| MS-TuP5 Optimized Cu Electrochemical Plating considering Pattern Dependency in Dual-Damascene Process H.-Y. Yoo, Chung-Ang University, Korea, N.-H. Kim, Chosun University, Korea, S.-Y. Kim, DongbuAnam Semiconductor Inc., E.-G. Chang, Chung-Ang University, Korea |
| MS-TuP7 Fabrication of High Precision Demultiplexer using Embossing Technique with Thermal Curable Polymers C.H. Choi, M.W. Lee, B.H. O, S.G. Lee, S.G. Park, E.H. Lee, Inha University, Korea |
| MS-TuP8 Silicon Etch for Nano-photonic Structure using Hydrogen Silsesquioxane (HSQ) as a Direct Etch Mask J.K. Kim, J.H. Sung, K.J. Lim, B.H. O, S.G. Park, Inha University, Korea |
| MS-TuP9 Mixed Oxidizer Effects on CMP (Chemical Mechanical Polishing) Performance of Nickel for MEMS G.-W. Choi, N.-H. Kim, Chosun Univ., Korea, Y.-J. Seo, Daebul Univ., Korea, W.-S. Lee, Chosun Univ., Korea |