AVS 52nd International Symposium
    Manufacturing Science and Technology Tuesday Sessions
       Session MS-TuP

Paper MS-TuP9
Mixed Oxidizer Effects on CMP (Chemical Mechanical Polishing) Performance of Nickel for MEMS

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Topics in Advanced Manufacturing Poster Session
Presenter: G.-W. Choi, Chosun Univ., Korea
Authors: G.-W. Choi, Chosun Univ., Korea
N.-H. Kim, Chosun Univ., Korea
Y.-J. Seo, Daebul Univ., Korea
W.-S. Lee, Chosun Univ., Korea
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Micro electro mechanical system (MEMS) technologies are miniaturized systems which comprise sensor, actuators and electronic functions thereby opening up a whole range of new applications and which would not be possible with purely micro electronic systems. These systems have both electrical and mechanical components. Making small machines which are almost invisible has been one of the dreams of mankind. Nickel and alloys based nickel have been found to have good mechanical properties that can be exploited to realize movable structures in MEMS devices, moreover the magnetic properties of nickel has been widely used in magnetic MEMS. In this study, the effects of oxidants on Nickel with 4 inch diameter and 3 mm thickness chemical mechanical polishing (CMP) process were investigated mixing three different oxidizers such as Fe(NO@sub 3@)@sub 3@, KIO@sub 3@, and H@sub 2@ O@sub 2@ with MSW 2000A slurry. Moreover, the interaction between the Nickel and the oxidizer was discussed by potentiodynamic polarization test with three different oxidizers, in order to compare the removal rate of nickel-CMP and electrochemical corrosion effects on the nickel as a function of oxidizers. As an experimental result, the removal rate of nickel was calculated by measuring the weight loss of the using Shimadzu AEX-300G balance. Fe(NO@sub 3@)@sub 3@ was higher than the other oxidizers. And as concentration in each of oxidizers increased, removal rate also increased, but over the amount, it decreased. Therefore, we conclude that nickel-CMP performances are strongly dependent on the kinds of oxidizers and the amounts of oxidizer additive. Acknowledgement: This work was supported by a Korea Research Foundation grant (KRF-2004-005-D00007).