AVS 52nd International Symposium
    Manufacturing Science and Technology Tuesday Sessions
       Session MS-TuP

Paper MS-TuP1
Dip-Pen Nanolithography-Based Fabrication of ZnO Microarrays

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Topics in Advanced Manufacturing Poster Session
Presenter: I. Takahiro, Nagoya University, Japan
Authors: I. Takahiro, Nagoya University, Japan
I. Kaoru, Nagoya University, Japan
S. Nagahiro, Nagoya University, Japan
T. Osamu, Nagoya University, Japan
Correspondent: Click to Email
Zinc oxide (ZnO) becomes one of the most important functional materials with unique properties of the near UV emission, optical transparency, electrical conductivity, and surface acoustic wave. Microarrays and micropatterning of functional ceramic materials are expected to provide various applications for microcircuit fabrication. Patterning and arraying techniques are useful for arranging wiring electrode. Conventionally, ZnO micro-patterns and arrays are fabricated by etching with photoresist like the lithography technique for Si. However, it is difficult to find the suitable etching conditions. To overcome the issue, site-selective growth techniques were recently developed. Dip-pen nanolithography (DPN) is a new promising scanning probe-based technique for fabricating sub-100 nm to many micrometer structures on surfaces, since it is a simple method for directly depositing material from an ink-coated atomic force microscope (AFM) tip onto a substrate with a high spatial resolution. In this study, we demonstrate the fabrication of ZnO microarrays on Au through DPN. An oxidized silicon wafer was coated with a Ti adhesion layer via thermal evaporation, which was subsequently coated with Au. DPN was then used to array ZnO microstructures on these substrates with Zn(NO3)2 solution. AFM-probe used in this study was immersed into the solution for a few minutes. The microstructures of ZnO were observed with field emission scanning electron microscope (FE-SEM).