| AVS 50th International Symposium | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS1-WeM1 The Study of Plasma Etching Limits Using Nanometer-Scale Self-Assembled Arrays Y. Zhang, T.J. Dalton, IBM |
| 8:40am | PS1-WeM2 Insights into Nanoparticle Formation Processes in a Thermal Plasma Process C.R. Perrey, C.B. Carter, T. Renault, A. Gidwani, R. Mukherjee, X. Wang, J. Hafiz, W.M. Mook, W.W. Gerberich, P.H. McMurry, J.V.R. Heberlein, S. Girshick, University of Minnesota |
| 9:00am | PS1-WeM3 Reactive Gas Condensation of Aluminum Nitride Nanoparticles C. Baker, A. Ceylan, S.I. Shah, University of Delaware |
| 9:20am | PS1-WeM4 Properties of Carbon-based Nanofibers Grown by Low-pressure Plasma Enhanced Chemical Vapor Deposition J.B.O. Caughman, L. Zhang, D.W. Austin, M.A. Guillorn, A.V. Melechko, V.I. Merkulov, Oak Ridge National Laboratory |
| 9:40am | PS1-WeM5 Growth of Vertically Aligned Carbon Nanotubes Using a High Density Plasma CVD Process H.W. Wei, K.C. Leou, M.T. Wei, K.J. Shen, C.H. Tsai, C. Lin, National Tsing Hua University, ROC |
| 10:00am | PS1-WeM6 Correlation between Size of Clusters and Qualities of a-Si:H Films for SiH@sub 4@ High Frequency Discharges K. Koga, N. Kaguchi, M. Shiratani, Y. Watanabe, Kyushu University, Japan |
| 10:20am | PS1-WeM7 Study of Plasma-Nanoporous Silica Surface Interactions in Fluorocarbon and O@sub2@ Discharges: Comparison with SiO@sub 2@ and Organosilicate Glass X. Hua, G.S. Oehrlein, R.M. Briber, University of Maryland, College Park, P. Lazzeri, N. Coghe, M. Anderle, Center for Scientific and Technological Research, Italy |
| 10:40am | PS1-WeM8 High Flux and Low Energy Neutral Beam Formation Using a Low Angle Forward Reflected Neutral Beam System D.H. Lee, S.J. Jung, Sungkyunkwan University, South Korea, K.H. Baek, C.J. Kang, Samsung Electronics, South Korea, G.Y. Yeom, Sungkyunkwan University, South Korea |