AVS 50th International Symposium
    Manufacturing Science and Technology Tuesday Sessions

Session MS-TuA
Directions in Semiconductor Device Scaling for the Next Decade

Tuesday, November 4, 2003, 2:00 pm, Room 309
Moderator: S. Shankar, Intel Corporation


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm MS-TuA1 Invited Paper
The Future of Chip Making Is Different --- Or Is It?
R. Puhakka, VLSI Research
2:40pm MS-TuA3 Invited Paper
Technology and Manufacturing Challenges in High Tech
R.L. Wisnieff, IBM Corporation, S.M. Rossnagel, IBM T.J. Watson Research Center
3:20pm MS-TuA5 Invited Paper
The Future of Semiconductor Lithography
W.J. Trybula, International SEMATECH
4:00pm MS-TuA7 Invited Paper
CMOS Scaling Limits and Opportunity for Nanoelectronics
Y. Nishi, Stanford University
4:40pm MS-TuA9 Invited Paper
John Bardeen and Transistor Physics
H.R. Huff, International SEMATECH