| 8:20am |
PS2-WeM1
Time-Dependent Electron Impact Source Functions in Inductive and Capacitive Plasma Sources Obtained Using an "On-The-Fly" Monte-Carlo Technique@footnote 1@
A. Sankaran, M.J. Kushner, University of Illinois |
| 8:40am |
PS2-WeM2
Global Neutral Modeling of Fluorine Plasma Etching for MEMS Applications
R.L. Jarecki, M.G. Blain, R.J. Shul, Sandia National Laboratories |
| 9:00am |
PS2-WeM3
Instabilities in Low-Pressure Electronegative Inductive Discharges
P. Chabert, Ecole Polytechnique, France, A.J. Lichtenberg, M.A. Lieberman, A.M. Marakhtanov, H.B. Smith, University of California, Berkeley, M. Tuszewski, Los Alamos National Laboratory |
| 9:20am |
PS2-WeM4
3-Dimensional Modeling of Asymmetric Gas Heating in Plasma Processing Reactors@footnote 1@
P. Subramonium, M.J. Kushner, University of Illinois |
| 9:40am |
PS2-WeM5 Invited Paper
Electron-Molecule Collisions in Processing Plasmas@footnote 1@
V. McKoy, California Institute of Technology |
| 10:20am |
PS2-WeM7
Ionization Mechanism in ICPs
F.F. Chen, UCLA |
| 10:40am |
PS2-WeM8
A 3-dimensional Model for Wave Propagation and Plasma Properties in Magnetically Enhanced ICP Reactors@footnote 1@
R.L. Kinder, M.J. Kushner, University of Illinois |
| 11:00am |
PS2-WeM9
Modeling of Fundamental Processes in a Capacitively Coupled Helium Atmospheric-Pressure Glow Discharges
X. Yuan, L.L. Raja, Colorado School of Mines |
| 11:20am |
PS2-WeM10
A Novel Approach for Control of High-Density Plasma Process Parameters through Optimal Pulse Shaping
T.L. Vincent, L.L. Raja, Colorado School of Mines |