| AVS 46th International Symposium | |
| Thin Films Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-TuA1 Preparation of Co and CoN@sub x@ Thin Films by Unbalanced r.f. Magnetron Sputtering T. Tanaka, Hiroshima Institute of Technology, Japan, A. Kitabatake, Sanyo Shinku Kogyo, Japan, K. Kawabata, Hiroshima Institute of Technology, Japan |
| 2:20pm | TF-TuA2 Microstructural Control of Thin Silicon Films Grown by Reactive Magnetron Sputtering Utilizing Low Energy Ion Bombardment J. Gerbi, J.R. Abelson, University of Illinois, Urbana-Champaign |
| 2:40pm | TF-TuA3 Invited Paper PVD of Thin Film Silicon: How Fast Light Atom and Slow Heavy Ion Bombardment During Growth Promote Low-Temperature Crystallinity J.R. Abelson, University of Illinois, Urbana |
| 3:20pm | TF-TuA5 Deposition Behavior and Film Characteristics of Aluminum Oxide Deposited using High Frequency Pulsed-DC Magnetron Reactive Sputtering D.C. Carter, G.W. McDonough, L.J. Mahoney, G.A. Roche, H.V. Walde, Advanced Energy Industries |
| 3:40pm | TF-TuA6 AC Reactive Sputtering of Dielectric Films using a Dual Magnetron A. Belkind, J. Cai, Stevens Institute of Technology, R. Scholl, Advanced Energy Industries, Inc. |
| 4:00pm | TF-TuA7 Characterization Studies of Reactively Pulsed Magnetron Sputtered Alumina Films P.J. Kelly, P.S. Henderson, R.D. Arnell, University of Salford, UK |
| 4:20pm | TF-TuA8 Change in Surface Roughness with the Thickness of TiO@sub2@ Film Grown on MgO(001) by Ar-ion Beam Sputtering T. Uchitani, K. Maki, Yokohama City University, Japan |
| 4:40pm | TF-TuA9 Chemical Vapor Deposition of Alpha Aluminum Oxide for High Temperature Aerospace Sensors R.H. Niska, AlliedSignal Aerospace Co., A.P. Constant, T. Witt, Iowa State University, O.J. Gregory, University of Rhode Island |
| 5:00pm | TF-TuA10 Phase Development of Radio Frequency Magnetron Sputter Deposited Pb(Mg@sub 1/3@Nb@sub 2/3@)O@sub 3@-PbTiO@sub 3@ (90/10) Thin Films J.-K. Lee, D.K. Park, D.-S. Cheong, Korea Institute of Science and Technology, J.-W. Park, Hanyang University, Korea |