| AVS 46th International Symposium | |
| Manufacturing Science and Technology Group | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:40am | MS-MoM2 Aspect Ratio Dependent Etching T.S. Cale, M. Bloomfield, S. Soukane, Rensselaer Polytechnic Institute |
| 9:00am | MS-MoM3 Invited Paper SEMATECH's Plasma Modeling Project G.L. Bell, P.M. Ryan, Oak Ridge National Laboratory |
| 9:40am | MS-MoM5 A Comparison of Spectroscopic Measurements of an Inductive Plasma Source with the INDUCT Model M.L. Huebschman, J.G. Ekerdt, University of Texas, Austin, P.A. Vitello, Lawrence Livermore National Laboratory, J.C. Wiley, University of Texas, Austin |
| 10:00am | MS-MoM6 Characterization of Showerhead Performance at Low Pressure D.B. Hash, ELORET, T. Mihopoulos, Motorola Inc., M. Meyyappan, NASA Ames Research Center, D.G. Coronell, Motorola Inc. |
| 10:20am | MS-MoM7 IMP-PVD Equipment Level Process Analysis Using Simulation P.L.G. Ventzek, S. Rauf, D.G. Coronell, V. Arunachalam, X.-Y. Liu, J. Arnold, D. Denning, S. Garcia, A. Korkin, Motorola Inc., Y.-K. Kim, National Institute of Standards and Technology |
| 10:40am | MS-MoM8 Invited Paper Holistic Yield Learning Methodology A.J. Strojwas, PDF Solutions Inc. |
| 11:20am | MS-MoM10 Particle Simulations of Chemically Reacting Plasmas M.A. Gallis, T.J. Bartel, Sandia National Laboratories |
| 11:40am | MS-MoM11 Simulations of Low Field Helicon Discharges@footnote 1@ R.L. Kinder, M.J. Kushner, University of Illinois, Urbana |