AVS 46th International Symposium
    Manufacturing Science and Technology Group Monday Sessions
       Session MS-MoM

Paper MS-MoM5
A Comparison of Spectroscopic Measurements of an Inductive Plasma Source with the INDUCT Model

Monday, October 25, 1999, 9:40 am, Room 611

Session: Advanced Design Methodologies and Factory Modeling
Presenter: M.L. Huebschman, University of Texas, Austin
Authors: M.L. Huebschman, University of Texas, Austin
J.G. Ekerdt, University of Texas, Austin
P.A. Vitello, Lawrence Livermore National Laboratory
J.C. Wiley, University of Texas, Austin
Correspondent: Click to Email
Noninvasive spectroscopic measurements of an inductively driven hydrogen plasma source with density and temperature characteristic of plasma processing tools have been done with an ultimate application of cleaning of silicon substrates These measurements allow full radial and axial profiles of electron density and temperature to be measured from absolutely calibrated multichannel spectroscopic measurements of upper state number densities and a collisional radiative model. Profiles were obtained over a range of powers from 50 to 200 W and pressures from 5 to 50 mtorr in hydrogen in a small cylindrical source. The hydrogen working gas and simple cylindrical geometry was chose to simplify detailed comparisons with a 2D computational model (INDUCT95) which uses a fluid approximation for the plasma and neutral gas. The code calculates the inductive coupling of the 13.56 MHz RF source, the collisional, radiative, and wall losses as well as a complete chemistry model for H@sub 2@, H, H@super +@, H@sub 2@@super +@ and H@sub 3@@super +@. We found good agreement between the model and experimental data over part of the operational range. Ranges of agreement and divergence will be discussed.