AVS 58th Annual International Symposium and Exhibition
    Applied Surface Science Division Monday Sessions

Session AS-MoM
Quantitative Surface Chemical Analysis and Technique Development - Part I

Monday, October 31, 2011, 8:20 am, Room 102
Moderator: Ian Gilmore, National Physical Laboratory, UK


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am AS-MoM1 Invited Paper
Characterization of Nano-structures from Analysis of the XPS Background: Automation and 3D-imaging
Sven Tougaard, University of Southern Denmark
9:00am AS-MoM3
Characterization of Model Gradient Inorganic Thin Films with XPS Spectral Modeling
Lance Lohstreter, Medtronic, Inc, R. Sanderson, J. Dahn, Dalhousie University, Canada
9:20am AS-MoM4
Corrections for Backscattering Effects in Quantitative Auger Analyses
A. Jablonski, Polish Academy of Sciences, Poland, Cedric Powell, National Institute of Standards and Technology
9:40am AS-MoM5
Effect of Monochromator X-ray Bragg Reflection on Photoelectric Cross Section
Alberto Herrera-Gomez, CINVESTAV-Unidad Queretaro, Mexico
10:00am AS-MoM6
An XPS Investigation of CdS Based Photoresistor During Operation
S. Suzer, Hikmet Sezen, Bilkent University, Turkey
10:40am AS-MoM8
Coronene Ion Bombardment Effects in the Quantitative Analysis of Polymeric Materials by XPS
Gerry Hammer, L.J. Gamble, D.G. Castner, University of Washington
11:00am AS-MoM9
Using A C60 Ion Source For Routine Surface Chemical Analyses
William Stickle, M.D. Johnson, D.K. Bilich, HP ADL Corvallis, C. Knutson, W. Wang, W. Cowell, Oregon State University
11:20am AS-MoM10
Large Area Quantitative XPS Imaging for Small Feature Compositional Screening
Sarah Coultas, C.J. Blomfield, S.J. Hutton, A.J. Roberts, Kratos Analytical Ltd, UK, D.J. Surman, Kratos Analytical Inc.
11:40am AS-MoM11
A New Type of Detector for Dynamic XPS Measurements
Konrad Winkler, P. Baumann, B. Kroemker, G. Pruemper, A. Feltz, Omicron NanoTechnology, Taunusstein, Germany