| AVS 58th Annual International Symposium and Exhibition | |
| Applied Surface Science Division | Monday Sessions |
| Session AS-MoM |
| Session: | Quantitative Surface Chemical Analysis and Technique Development - Part I |
| Presenter: | Gerry Hammer, University of Washington |
| Authors: | G.E. Hammer, University of Washington L.J. Gamble, University of Washington D.G. Castner, University of Washington |
| Correspondent: | Click to Email |
XPS has long been a primary technique for the analysis of material surfaces, providing quantitative analysis of elemental atomic concentrations and chemical bonding states. When combined with ion sputter etching, it has provided a similar level of detail in depth profiling of metals, semiconductors, and inorganic compounds; however, the damage produced by ion bombardment precluded the depth profiling of organic and polymeric specimens. More recently it has been shown that sputter etching by carbon cluster ions significantly reduces the apparent damage to such materials, presumably the result of a combination of a reduced damage layer thickness and efficient removal of the damaged material. In this work we have used a coronene (C24H12+) ion source to sputter etch a series of organic compounds and polymers, including trehalose, poly(amide), poly(glycolic acid), poly(lactic acid), poly(ethylene glycol), poly(methyl methacrylate), poly(acrylonitrile), poly(ethylene terephalate), poly(vinyl chloride), and poly(tetrafluoroethylene). Specimens were sputtered to a steady-state condition and analyzed by XPS. Elemental composition and chemical bonding were compared to the original surface and the theoretical values. These data will be used to refine our understanding of cluster ion bombardment effects in polymers, and to interpret data from the analysis of future materials and devices.