| AVS 55th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-ThA1 Invited Paper Thin Film Challenges for Flexible Displays and Electronics R. Ma, M. Hack, J. Brown, Universal Display Corporation |
| 2:40pm | TF-ThA3 Roll-to-Roll Plasma Enhanced Chemical Vapor Deposition of Graded Ultra-high Barrier Coatings on Polymer Substrates M. Yan, R.A. Zhao, D.J. Smith, C.L. Jones, P.A. Mcconnelee, A.G. Erlat, A.R. Duggal, T.P. Feist, GE Global Research |
| 3:00pm | TF-ThA4 Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology M.A. George, J.E. Madocks, J. Morris, H. Chandra, General Plasma |
| 3:20pm | TF-ThA5 Low Damage Sputter-Deposition System for the Deposition of TCO Films on Organic Films H. Lei, K. Ichikawa, T. Uchida, Y. Hoshi, Tokyo Polytechnic University, Japan |
| 4:00pm | TF-ThA7 Sputter Deposition of Highly Flexible ITO on Polymeric Substrates M. Yan, A.G. Erlat, B. Scherer, P.A. Mcconnelee, A.R. Duggal, T.P. Feist, GE Global Research |
| 4:20pm | TF-ThA8 Thermally Stable Very Thin Ag Films for Electrodes M. Kawamura, D. Fukuda, Y. Inami, Y. Abe, K. Sasaki, Kitami Institute of Technology, Japan |
| 4:40pm | TF-ThA9 High Rate Sputtering Deposition of Silicon Oxide Thin Films from New SiO2:Si Target Composition Q.H. Fan, Wintek Electro-Optics Corp, L.Q. Zhou, University of Michigan, D. Stevenson, Wintek Electro-Optics Corp. |
| 5:00pm | TF-ThA10 Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications H. Chandra, M.A. George, S. Higgins, P.L. Morse, J.E. Madocks, General Plasma Incorporated |
| 5:20pm | TF-ThA11 Field-Effect Mobility Enhancement of Organic Thin Film Transistors on Flexible Substrates with Organosilanes-based Surface Modification C.G. Takoudis, L. Jiang, University of Illinois at Chicago, J. Zhang, D.R. Gamota, Motorola |