AVS 55th International Symposium & Exhibition
    Thin Film Thursday Sessions
       Session TF-ThA

Paper TF-ThA3
Roll-to-Roll Plasma Enhanced Chemical Vapor Deposition of Graded Ultra-high Barrier Coatings on Polymer Substrates

Thursday, October 23, 2008, 2:40 pm, Room 302

Session: Thin Films for Displays and Flexible Electronics
Presenter: M. Yan, GE Global Research
Authors: M. Yan, GE Global Research
R.A. Zhao, GE Global Research
D.J. Smith, GE Global Research
C.L. Jones, GE Global Research
P.A. Mcconnelee, GE Global Research
A.G. Erlat, GE Global Research
A.R. Duggal, GE Global Research
T.P. Feist, GE Global Research
Correspondent: Click to Email

The use of plastic film substrates for organic electronic devices promises to enable new applications, such as flexible displays and conformal lighting, at low cost through high volume roll-to-roll fabrication. Unfortunately, presently available substrates cannot yet deliver this promise because of the challenge in achieving the required combination of optical transparency, impermeability to water and oxygen, mechanical flexibility, and high temperature capability. In this contribution, we describe our roll-to-roll (R2R) plasma enhanced chemical vapor deposition (PECVD) process development and performance of a unique graded transparent ultra-high gas barrier coating on top of plastic substrate which is aimed at meeting this challenge.