| AVS 55th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThA |
| Session: | Thin Films for Displays and Flexible Electronics |
| Presenter: | Y. Hoshi, Tokyo Polytechnic University, Japan |
| Authors: | H. Lei, Tokyo Polytechnic University, Japan K. Ichikawa, Tokyo Polytechnic University, Japan T. Uchida, Tokyo Polytechnic University, Japan Y. Hoshi, Tokyo Polytechnic University, Japan |
| Correspondent: | Click to Email |
We examined damages produced in organic materials during sputter-deposition of electrode film by measuring a change of photo-luminescence (PL) intensity of organic light emitting materials and developed a low damage sputter-deposition system. MEH-PPV as polymer and BAlq3 as small molecule were used for the light emitting materials. We compared the damages produced in the deposition of electrode films(ITO) by using different types of sputtering systems, i.e., a facing target sputtering (FTS) system and a conventional planar rf-magnetron sputtering (rf-MS) system. By using FTS system, decrease in PL intensity was suppressed remarkably compared with the using of rf-MS. In addition, removing the bombardment of high energy secondary electrons to the film surface was very effective to reduce the damages of the organic films. Furthermore, reduction of kinetic energy of deposition particles to the organic film surface by increasing sputtering gas pressure was necessary to reduce the damages of the organic films. Finally, we could deposit ITO films on the organic films without damages by using a FTS system, where bombardment of high energy negative oxygen ions, high energy secondary electrons, and high energy deposition particles to the organic film were completely removed.