| 2:20pm |
PS-WeA1
INVITED TALK: A Tribute to John W. Coburn
David Graves, University of California at Berkeley |
| 2:40pm |
PS-WeA2
INVITED TALK: Interfacial Chemistry in Highly Reactive Systems
Frances Houle, Lawrence Berkeley National Laboratory |
| 3:00pm |
PS-WeA3
INVITED TALK: Rare Gas Actinometry Turns Thirty Nine and is Still Finding Applications
Vincent M. Donnelly, University of Houston |
| 3:20pm |
PS-WeA4
INVITED TALK: A Leader In Etching (ALE): How John Coburn Paved the way for Atomic Layer Etching
Jane P. Chang, University of California, Los Angeles |
| 4:20pm |
PS-WeA7
INVITED TALK: Materials Processing Using Low Temperature Plasma Surface Interactions: Examples of the Influence of John Coburn
Gottlieb S. Oehrlein, University of Maryland, College Park |
| 4:40pm |
PS-WeA8
INVITED TALK: A Brief Overview on Molecular Dynamics Simulations of Plasma-surface Interaction in Reactive Ion Etching
Emilie Despiau-Pujo, LTM, Univ. Grenoble Alpes, CNRS, France |
| 5:00pm |
PS-WeA9
INVITED TALK: Plasma ALD – A Discussion of Mechanisms
K. Arts, V. Vandalon, H.C.M. Knoops, Erwin Kessels, Eindhoven University of Technology, The Netherlands |
| 5:20pm |
PS-WeA10
INVITED TALK: RF Plasmas for Material Etching, Deposition, and Surface Modification
Dennis Hess, Georgia Institute of Technology |