AVS 66th International Symposium & Exhibition
    Plasma Science and Technology Division Wednesday Sessions
       Session PS-WeA

Paper PS-WeA10
INVITED TALK: RF Plasmas for Material Etching, Deposition, and Surface Modification

Wednesday, October 23, 2019, 5:20 pm, Room B130

Session: Commemorating the Career of John Coburn (ALL INVITED SESSION)
Presenter: Dennis Hess, Georgia Institute of Technology
Correspondent: Click to Email

For the past 40 years, rf plasmas have been used extensively for thin film etching and deposition in electronic and photonic device fabrication. However, unique surface properties on materials such as paper and other porous substrates can be generated using these low temperature reactive atmospheres. Examples of surface modification for applications in paper-based medical tests strips and microfluidic device structures through the use of fluorinated and non-fluorinated plasma treatments will be presented.