AVS 66th International Symposium & Exhibition
    Plasma Science and Technology Division Wednesday Sessions
       Session PS-WeA

Paper PS-WeA7
INVITED TALK: Materials Processing Using Low Temperature Plasma Surface Interactions: Examples of the Influence of John Coburn

Wednesday, October 23, 2019, 4:20 pm, Room B130

Session: Commemorating the Career of John Coburn (ALL INVITED SESSION)
Presenter: Gottlieb S. Oehrlein, University of Maryland, College Park
Correspondent: Click to Email
John Coburn’s pioneering work on plasma-assisted etching reactions of materials has had a profound and lasting influence on our scientific understanding and approaches of studying mechanisms of low temperature plasma-assisted processing of materials. As a colleague at IBM Research I had the opportunity to learn from and interact with John, and his colleagues Harold Winters and Eric Kay, with whom he worked very closely for many years. In this talk I will discuss several topics that were important to John, and how they reflected in my own research and recent work performed by members of my group, including ion bombardment, ion-neutral synergies and etching directionality in pattern transfer, the fluorine/carbon ratio of fluorocarbon etching chemistries introduced by John and colleagues, and several related topics.