| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS+TF-MoM1 ZrO2 Deposition using a 2.45 GHz Atmospheric Pressure Plasma Torch Dhruval Patel, L. Bonova, C. Ahn, D.V. Krogstad, D.N. Ruzic, University of Illinois at Urbana-Champaign, S. Chaudhuri, University of Illinois at Chicago |
| 8:40am | PS+TF-MoM2 Ion Energy Characteristics during Plasma-Enhanced Atomic Layer Deposition and their Role in Tailoring Material Properties Tahsin Faraz, K. Arts, S. Karwal, M.C. Creatore, Eindhoven University of Technology, The Netherlands, H.C.M. Knoops, Oxford Instruments, The Netherlands, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 9:00am | PS+TF-MoM3 Invited Paper Plasma Deposition of Functional, Nanostructured Coatings on Materials and Nanomaterials Derived from the Wood Biomass Luc Stafford, Université de Montréal, Canada |
| 9:40am | PS+TF-MoM5 Mechanisms of Halogenated Silane Decomposition on an N-rich Surface during Atomic Layer Deposition of Silicon Nitride Gregory Hartmann, University of Texas at Austin, P.L.G. Ventzek, Tokyo Electron America, Inc., K. Ishibashi, T. Iwao, Tokyo Electron Technology Solutions Ltd., Japan, G.S. Hwang, University of Texas at Austin |
| 10:00am | PS+TF-MoM6 Characterization of Inductively Coupled Plasma Source for Plasma Enhanced Atomic Layer Deposition Premkumar Panneerchelvam, A. Agarwal, KLA-Tencor, D.R. Boris, S.G. Walton, Naval Research Laboratory |
| 10:40am | PS+TF-MoM8 Structural, Optical, and Electrical Properties of Plasma-Enhanced Atomic Layer Deposited ZnO: Influence of Substrate Temperature Julian Pilz, A. Perrotta, A.M. Coclite, Graz University of Technology, Austria |
| 11:00am | PS+TF-MoM9 Critical Effect of the Presence and Position of Double Bonds in the Atmospheric Plasma Synthesis of Organic Coatings Jérémy Mertens, J. Baneton, A. Ozkan, F. Reniers, Université Libre de Bruxelles, Belgium |
| 11:20am | PS+TF-MoM10 Capacitively Coupled DC/RF Discharges for PEALD Process of Titanium Dioxide Films Shinya Iwashita, A. Suzuki, T. Shindo, T. Kikuchi, T. Matsudo, Y. Morita, T. Moriya, Tokyo Electron Technology Solutions Ltd., Japan, A. Uedono, University of Tsukuba, Japan |
| 11:40am | PS+TF-MoM11 The Effects of Varying Plasma Conditions on Plasma Enhanced Atomic Layer Epitaxy D.R. Boris, V.D. Wheeler, U.S. Naval Research Laboratory, V.R. Anderson, Kennesaw State University, N. Nepal, U.S. Naval Research Laboratory, S.G. Rosenberg, A.C. Kozen, ASEE Postdoctoral Fellow, S.G. Walton, U.S. Naval Research Laboratory, Charles R. Eddy, Jr., U. S. Naval Research Laboratory |