| AVS 65th International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | EL+AS+EM-MoM1 Invited Paper Stealth Technology-based Terahertz Frequency-domain Ellipsometry Vanya Darakchieva, Linköping University, Sweden |
| 9:00am | EL+AS+EM-MoM3 Spectroscopic Ellipsometry and Finite Element Modeling based Optical Characterization of Highly Coherent Au-Si Slanted Columnar Periodic Nanostructures Ufuk Kilic, University of Nebraska-Lincoln, A. Mock, Linkӧping University, Sweden, R. Feder, Fraunhofer IMWS, Germany, D. Sekora, M. Hilfiker, R. Korlacki, E. Schubert, C. Argyropoulos, M. Schubert, University of Nebraska-Lincoln |
| 9:20am | EL+AS+EM-MoM4 Temperature Dependent Dielectric Function and Critical Point Comparison of bulk Ge and α-Sn on InSb Rigo Carrasco, C. Emminger, N. Samarasingha, F. Abadizaman, S. Zollner, New Mexico State University |
| 9:40am | EL+AS+EM-MoM5 Elastomer Thin Films and Conducting Nanostructures for Soft Electronics and Dielectric Elastomer Transducers Bert Müller, B. Osmani, T. Töpper, University of Basel, Switzerland |
| 10:00am | EL+AS+EM-MoM6 Spectroscopic Ellipsometry Investigation of Temperature Effects in Heated Self-organized 2D Arrays of Au Nanoparticles Michele Magnozzi, M. Ferrera, M. Canepa, Università di Genova, Italy, F. Bisio, CNR-SPIN, Italy |
| 10:40am | EL+AS+EM-MoM8 Spectroscopic Ellipsometry of 2D WSe2 Films Baokun Song, H.G. Gu, M.S. Fang, Huazhong University of Science & Technology, China, Y.L. Hong, W.C. Ren, Shenyang National Laboratory for Materials Science Institute of Metal Research Chinese Academy of Sciences, China, X.G. Chen, S.Y. Liu, Huazhong University of Science & Technology, China |
| 11:00am | EL+AS+EM-MoM9 Thermal Evolution Process of MaPbI3 Film Based on Spectroscopic Ellipsometry X.Q. Wang, X.Y. Shan, H. Siddique, Rucheng Dai, Z.P. Wang, Z.J. Ding, Z.M. Zhang, University of Science and Technology of China |
| 11:20am | EL+AS+EM-MoM10 a-Si as a Protective Layer to Block the Oxidization of Al mirrors Yhoshua Wug, University of California at Los Angeles, D.D. Allred, R.S. Turley, Brigham Young University |
| 11:40am | EL+AS+EM-MoM11 Terahertz to Mid-infrared Dielectric Response of Poly-methacrylates for Stereolithographic Single Layer Assembly D.B. Fullager, Serang Park, Y. Li, J. Reese, University of North Carolina at Charlotte, E. Sharma, S. Lee, Harris Corporation, S. Schӧche, C.M. Herzinger, J.A. Woollam Co. Inc, G.D. Boreman, T. Hofmann, University of North Carolina at Charlotte |