| AVS 65th International Symposium & Exhibition | |
| Extending Additive Manufacturing to the Atomic Scale Focus Topic | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | AM+MP+NS-WeA1 Invited Paper Advanced Scanning Probe Lithography: Processes, Nanopatterning and Nanoelectronics Ricardo Garcia, Inst Ciencia Materiales Madrid, CSIC, Spain |
| 3:00pm | AM+MP+NS-WeA3 Integrated Devices made Using Atomically Precise Advanced Manufacturing D. Ward, D. Campbell, M. Marshall, T.-M. Lu, L. Tracy, L. Maurer, A. Baczweski, Shashank Misra, Sandia National Laboratories |
| 4:20pm | AM+MP+NS-WeA7 Electrical Transport Properties of Si:P δ-layer Devices Ranjit Kashid, X. Wang, Namboodiri, J. Hagmann, National Institute of Standards and Technology (NIST), S.W. Schmucker, University of Maryland College Park, J. Wyrick, C. Richter, R.M. Silver, National Institute of Standards and Technology (NIST) |
| 4:40pm | AM+MP+NS-WeA8 Atomically Precise Tip Positioning for Automated Writing of Atomic-scale Devices James Owen, E. Fuchs, J.N. Randall, J.R. Von Ehr, Zyvex Labs |
| 5:00pm | AM+MP+NS-WeA9 Invited Paper Kilobyte Scale Data Storage through Autonomous Atom Assembly A.F. Otte, David Coffey, Delft University of Technology, Netherlands |
| 5:40pm | AM+MP+NS-WeA11 Invited Paper Extending the Capabilities of STM-based Dopant Device Fabrication T. Skeren, N. Pascher, S.A. Köster, Andreas Fuhrer, IBM Research - Zurich, Switzerland |