AVS 65th International Symposium & Exhibition
    Extending Additive Manufacturing to the Atomic Scale Focus Topic Wednesday Sessions
       Session AM+MP+NS-WeA

Invited Paper AM+MP+NS-WeA1
Advanced Scanning Probe Lithography: Processes, Nanopatterning and Nanoelectronics

Wednesday, October 24, 2018, 2:20 pm, Room 102B

Session: Atomic Scale Manipulation with SPM
Presenter: Ricardo Garcia, Inst Ciencia Materiales Madrid, CSIC, Spain
Correspondent: Click to Email

The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We introduce several methods, interactions and/or processes such as chemical, mechanical or thermal that enable the tip to modify surfaces. In particular, the presentation is focused on describing the fundamentals and applications of oxidation SPL for nanopatterning and device fabrication of nanoscale field-effect transistors, quantum dots, biosensors and molecular architectures involving a variety of systems from 2D materials to biomolecules; from self-assembled monolayers to silicon.

References

-R. Garcia, A.W. Knoll, E. Riedo, Advanced scanning probe lithography. Nature Nanotechnology 9, 577-587 (2014)

-Y.K. Ryu, R. Garcia, Advanced oxidation scanning probe lithography. Nanotechnology 28, 142003 (2017).

-A.I. Dago et al. Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography, Carbon 129, 281 (2018).