AVS 59th Annual International Symposium and Exhibition
    Plasma Science and Technology Tuesday Sessions

Session PS1-TuA
Plasma Deposition and Plasma Enhanced ALD

Tuesday, October 30, 2012, 2:00 pm, Room 24
Moderator: S. Agarwal, Colorado School of Mines


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS1-TuA1 Invited Paper
Looking Down the Rabbit Hole: Impact of Porosity in Plasma-deposited Inorganic Layers on Their Moisture Permeation Barrier Performance
M. Creatore, Eindhoven University of Technology, The Netherlands
2:40pm PS1-TuA3
Dual Etching and Deposition Mechanism of a Microwave Alcohol Plasma on Commercial Polymers for the Enhancement of Adhesion
C.J. Hall, P.J. Murphy, H.J. Griesser, University of South Australia
3:00pm PS1-TuA4
The Roles of Ions and Neutrals in Growth Mechanisms of Plasma Polymer Films
A. Michelmore, University of South Australia
4:00pm PS1-TuA7
Defect Analysis and Mechanical Performance of Optoelectronic Thin Films Deposited on Flexible Substrates
R. Patel, C.A. Wolden, Colorado School of Mines
4:20pm PS1-TuA8
Plasma Polymerization of Ethyl Lactate
S. Ligot, University of Mons, Belgium, F. Renaux, Materia Nova Research Center, Belgium, L. Denis, University of Mons, Belgium, D. Cossement, Materia Nova Research Center, Belgium, P. Dubois, R. Snyders, University of Mons, Belgium
4:40pm PS1-TuA9
Functional Carbon Contained Film Formation using Neutral-Beam-Enhanced Chemical-Vapor-Deposition by Microwave Plasma
Y. Kikuchi, Tohoku University and Tokyo Electron, Japan, A. Wada, S. Samukawa, Tohoku University, Japan
5:00pm PS1-TuA10
Nano-crystalline Silicon Deposition using a Layer-by-layer Technique
Z. Chen, M.N. Iliev, J.A. Mucha, University of Houston, Y.K. Pu, Tsinghua University, China, D.J. Economou, V.M. Donnelly, University of Houston
5:20pm PS1-TuA11
Role of PEALD Reactor Wall Conditions on Radical and Ion Substrate Fluxes
M.J. Sowa, M.J. Sershen, G. Sundaram, J.S. Becker, Cambridge NanoTech, Inc.
5:40pm PS1-TuA12
Tuning Material Properties in ALD ZnO Films: In Situ Plasma Treatments and Doping
M.A. Thomas, Stetson University, J.B. Cui, University of Arkansas at Little Rock