AVS 53rd International Symposium | |
Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | TF-MoA1 Molecular Layer Controlled Deposition of Polymer Thin Films A.A. Dameron, Y. Du, N.M. Adamczyk, S.M. George, University of Colorado at Boulder |
2:20pm | TF-MoA2 Gas Diffusion Barriers on Polymers Using Al@sub2@O@sub3@ Atomic Layer Deposition M.D. Groner, A.A. Dameron, University of Colorado, R.S. McLean, P.F. Carcia, DuPont Central Research & Development, S.M. George, University of Colorado |
2:40pm | TF-MoA3 Invited Paper Atomic Layer Deposition of In@sub 2@O@sub 3@ Using Cyclopentadienyl Indium: A New Synthetic Route to Transparent Conducting Oxide Films J.W. Elam, Argonne National Laboratory, A.B.F. Martinson, Northwestern University, M.J. Pellin, Argonne National Laboratory, J.T. Hupp, Northwestern University |
3:20pm | TF-MoA5 Fabrication of Integrated Scanning Electrochemical-Atomic Force Microscopy Probes by Atomic Layer Deposition of Aluminum Oxide D.J. Comstock, M.C. Hersam, Northwestern University, J.W. Elam, M.J. Pellin, Argonne National Laboratory |
3:40pm | TF-MoA6 Stand-Alone TiO@sub2@ Nanotubes for Nano-Sensors using Atomic Layer Deposition and Focused Ion Beam D.K. Cha, B.K. Lee, M.J. Kim, J. Kim, University of Texas at Dallas |
4:00pm | TF-MoA7 Atomic Layer Deposition of Electrocatalytic Platinum for Solid Oxide Fuel Cells X. Jiang, S.F. Bent, Stanford University |
4:20pm | TF-MoA8 Co and CoSi@sub 2@ Films Prepared by Plasma-Enhanced Atomic Layer Deposition for Contact Applications H.-B.-R. Lee, H. Kim, POSTECH, Korea |