AVS 53rd International Symposium
    Thin Film Monday Sessions
       Session TF-MoA

Paper TF-MoA1
Molecular Layer Controlled Deposition of Polymer Thin Films

Monday, November 13, 2006, 2:00 pm, Room 2022

Session: ALD and Applications II
Presenter: A.A. Dameron, University of Colorado at Boulder
Authors: A.A. Dameron, University of Colorado at Boulder
Y. Du, University of Colorado at Boulder
N.M. Adamczyk, University of Colorado at Boulder
S.M. George, University of Colorado at Boulder
Correspondent: Click to Email
Conformal polymeric thin films can be fabricated using sequential, self-limiting surface chemistries that are similar to atomic layer deposition (ALD). The simplest repetitive surface chemistry for this molecular layer controlled polymer growth is based on the reaction of two bifunctional monomer reactants. This type of polymer film growth was originally demonstrated in the 1990s in various Japanese laboratories. Subsequently, little work has been done to understand or to utilize this polymer growth method. To further develop this important technique, we have explored the condensation reaction of 1,6-hexanediamine (H@sub 2@N-(CH@sub 2@)@sub 6@-NH2) with adipoyl chloride (ClOC-(CH@sub 2@)@sub 4@-COCl) to fabricate Nylon 66 (polyamide) films. By monitoring the infrared absorbance for the C-H, N-H and C=O stretching vibrations using Fourier transform infrared spectroscopy, we have observed the linear growth of the Nylon 66 films versus number of AB reaction cycles. Polymeric condensation reactions provide a wide spectrum of other possible reactant candidates. Currently, we are exploring surface chemistries for the molecular layer controlled deposition of other polymers such as polyester. In addition, polymeric materials can be combined together with inorganic materials to form laminate structures. We have demonstrated the growth of Nylon 66/Al@sub 2@O@sub 3@ nanolaminate films. Other polymeric/inorganic films can be fabricated to create new multifunctional materials.