| AVS 53rd International Symposium | |
| Nano-Manufacturing Topical Conference | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | NM+NS+NNT-WeM1 Invited Paper Nanoimprint: Diversity in Materials, Processes and Application H. Schift, Paul Scherrer Institute (PSI), Switzerland, J. Ahopelto, VTT Centre for Microelectronics, Finland, A. Kristensen, Technical University of Denmark, C.M. Sotomayor Torres, Tyndall National Institute, Ireland, M. Tormen, INFM-TASC, Italy |
| 8:40am | NM+NS+NNT-WeM3 Invited Paper Nanoimprint Lithography: Technology, Applications and Commercialization S.Y. Chou, Princeton University |
| 9:20am | NM+NS+NNT-WeM5 Invited Paper Nanoimprint and Nanopatterning in Japan H. Hiroshima, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| 10:40am | NM+NS+NNT-WeM9 Invited Paper Metrology for Nanoimprint Technologies: Needs and Prospects C.L. Soles, H.W. Ro, Y. Ding, H.J. Lee, R.L. Jones, A. Karim, National Institute of Standards & Technology |
| 11:20am | NM+NS+NNT-WeM11 Invited Paper Large Area Ultraviolet Nanoimprint Lithography Applicable to Flat Panel Display E.-S. Lee, Korea Institute of Machinery & Materials, Korea |