AVS 53rd International Symposium
    Nano-Manufacturing Topical Conference Wednesday Sessions
       Session NM+NS+NNT-WeM

Invited Paper NM+NS+NNT-WeM1
Nanoimprint: Diversity in Materials, Processes and Application

Wednesday, November 15, 2006, 8:00 am, Room 2018

Session: International Developments in Nanoimprint Lithography
Presenter: H. Schift, Paul Scherrer Institute (PSI), Switzerland
Authors: H. Schift, Paul Scherrer Institute (PSI), Switzerland
J. Ahopelto, VTT Centre for Microelectronics, Finland
A. Kristensen, Technical University of Denmark
C.M. Sotomayor Torres, Tyndall National Institute, Ireland
M. Tormen, INFM-TASC, Italy
Correspondent: Click to Email
Replication by molding offers more than high resolution and mass fabrication aspects. By creating a 3D structure by mechanical displacement of material, the patterning of a range of specific functional materials becomes possible, without loosing their chemical properties. Furthermore this ability can be used to fabricate complex structures, e.g. by building up devices with imbedded channels. Many of these aspects play a role within the European Integrated Project NaPa.@footnote 1@ Its aim is not only the further development of emerging nanopatterning methods, including processes, tools, and materials, but also a range of applications, which go far beyond the development of a next generation nanolithography for chip manufacturing. Nanoimprint lithography of thermoplastic materials remains the technology with the imminent highest potential, because of its ability to integrate different materials and functionalities, and by its compatibility with other mass fabrication processes such as injection molding and roll embossing.@footnote 2@ Typical applications can be seen in the topological and chemical patterning of templates for displays and cell growth, the integration of fluidic and optical functionalities in a lab-on-a-chip, and patterning of special polymers intended for polymer electronics and optics. This is achieved by using new thermoplastic polymers, or by incorporating dyes and nanoparticles with specific functionalities, e.g. for optical devices. Throughput is enhanced by using heatable stamps, and flexibility by a step and stamp approach. This toolbox, ranging from mold fabrication to analytical tools, is a prerequisite to establish nanoimprint as a future core technology in the heart of Europe. @FootnoteText@ @footnote 1@ EC-funded project NaPa (Emerging Nanopatterning Methods). URL: http://www.phantomsnet.net/NAPA/index.php.@footnote 2@ H. Schift and A. Kristensen. In Handbook of Nanotechnology, Bhushan B. ed., 2nd edition, publisher Springer Verlag, Germany (2006).