AVS 53rd International Symposium
    Nano-Manufacturing Topical Conference Wednesday Sessions
       Session NM+NS+NNT-WeM

Invited Paper NM+NS+NNT-WeM11
Large Area Ultraviolet Nanoimprint Lithography Applicable to Flat Panel Display

Wednesday, November 15, 2006, 11:20 am, Room 2018

Session: International Developments in Nanoimprint Lithography
Presenter: E.-S. Lee, Korea Institute of Machinery & Materials, Korea
Correspondent: Click to Email
Nanoimprint lithography (NIL) is known as an emerging lithography with a resolution of less than 10 nm, having a high throughput and low cost compared to the conventional photolithography. In this talk, we present very large area (> 20 inch) Ultraviolet Nanoimprint Lithography (UV-NIL) process as a breakthrough strategy for flat panel display industry. As thin film transistor liquid crystal display (TFT-LCD) manufacturers in Korea ramp up output of TV panels from advanced factories in anticipation of strong demand, the excess supply in the market is leading to steep price declines especially for TV use panels. Succeeding generation plants use larger glass substrates, thereby boosting output and helping manufacturer’s lower production costs. Falling LCD panel prices may be tough for LCD manufacturers to swallow. There is something in creating profit besides investment in upgrading generation. That can only be possible by conversing process facilities to use advanced process technology. This talk will summarize activities for the development of large area UV-NIL at KIMM to date and in detail. Very large area UV-NIL process and its apparatus for the TFT-LCD pattern will be presented.